Nanometer clay modified silide composition for filming on polished brick and its prepn process
A technology of silicon compound and composition, which is applied in the field of preparation of the composition, can solve the problems of short antifouling effective time, reduce the aesthetic feeling and texture of polished tiles, and have no significant effect on the gloss of polished tiles, so as to increase the antibacterial effect
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[0024] The specific components of the nano-clay-modified silicon compound composition used for polishing brick film-forming in the present invention are:
[0025] 100 parts by weight of a water-soluble or oil-soluble organic / inorganic composite silicon compound binder, with a pH value of 9-10, a specific gravity of 1.0-1.3, and a solid content of 3%-30%
[0026] 15 parts by weight of layered silicate nanoclay, containing more than 80% of montmorillonite, bentonite, hectorite or vermiculite, attapulgite, and sericite-type layered silicate purified minerals, with a particle size of 200 to 1,000 Mesh, specific surface area 700-800m 2 / g, with exchangeable cation Li between the layers + 、Na + , Ca +2 and Mg +2 etc., the ion exchange capacity (CEC value) is 50-200meq / 100g, the thickness of the clay layer is 0.5-1.2nm, and the interlayer distance is 0.8-2.5nm
[0027] The surfactant of 10 parts by weight is commercially available cationic, anionic, amphoteric surfactants
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