Water-based diamond polishing liquid and its production

A polishing liquid and diamond micro-powder technology, applied in the field of polishing liquid, can solve the problems of easy sedimentation, large proportion of diamond micro-powder, inconsistent content of diamond micro-powder, etc., and achieve the effect of increasing content, consistent product quality and good stability

Inactive Publication Date: 2007-04-04
耐博检测技术(上海)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the specificity of diamond micropowder is large, and it is easy to settle in water and eventually completely precipitate, which will lead to inconsistent content of diamond micropowder in the polishing liquid during processing, which will seriously affect the polishing quality and polishing efficiency.
For solving this problem, Chinese Patent Publication No. CN1560161A

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Example 1: Add diamond micropowder with a particle size range of 1000-2000nm into 98% concentrated sulfuric acid, ultrasonically disperse, heat to 200°C and keep it warm for 2 hours, then centrifuge after cooling, wash with deionized water until neutral, 105°C Dry and set aside. Mix 0.2 part of sodium hexametaphosphate, 0.5 part of lithium bentonite, 0.2 part of methanol, 0.1 part of Skane M-8 fungicide (product of Rohm&Haas company), 97 parts of deionized water, add 2 parts of dried diamond powder, and ultrasonically Disperse and adjust the pH value to 10 with sodium carbonate to obtain a polishing solution with a diamond content of 2%.

[0033] The sedimentation value of the above-mentioned polishing liquid was determined to be 9.

Embodiment 2

[0034] Embodiment 2: The heating temperature is increased to 300° C., and the others are the same as in Embodiment 1.

[0035] The sedimentation value of the above-mentioned polishing liquid was measured to be 7.

Embodiment 3

[0036] Embodiment 3: use the diamond micropowder of particle size range 500-1000nm, its processing method is the same as embodiment 1. 0.5 parts of sodium dodecylsulfonate, 0.5 parts of V-15 fumed silica (product of Wacker Company), 0.01 parts of ethylene glycol, 0.1 parts of Skane M-8 fungicide, and Mix 96 parts of deionized water, add 3 parts of dried diamond micropowder, ultrasonically disperse, adjust the pH value to 9 with triethanolamine, and obtain a polishing solution with a diamond content of 3%.

[0037] The sedimentation value of the above-mentioned polishing liquid was determined to be 5.

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PUM

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Abstract

A water-based diamond polishing liquid and its production are disclosed. The polishing liquid consists of diamond fine 0.001-10 proportion, dispersing agent 0.02-4 proportion, suspending agent 0.01-5 proportion, suspending auxiliary 0.01-1 proportion, pH regulator 0.1-1.5 proportion, antiseptics 0.1-0.5 proportion and deionized water 60-99 proportion. The sediment value can be 0. It has good quality and excellent stability.

Description

technical field [0001] The invention relates to a polishing liquid used in the fields of grinding and polishing, and more specifically relates to a water-based diamond polishing liquid and a preparation method thereof. Background technique [0002] High-hardness diamond micropowder is spherical or ellipsoidal in shape. It is used for grinding and polishing without scratching the object to be ground. It is widely used in different polishing fields, especially in the field of precision polishing. Diamond micropowder can be made into ointment, aerosol, water-based or oil-based liquid polishing materials, among which water-based diamond polishing liquid has the characteristics of environmental protection, non-corrosiveness, low cost and high polishing efficiency, and has been widely used in various fields. Applications. However, the specificity of diamond micropowder is large, and it is easy to settle in water and eventually completely precipitate, which will lead to inconsiste...

Claims

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Application Information

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IPC IPC(8): C09K3/14
Inventor 章利球
Owner 耐博检测技术(上海)有限公司
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