Method for cleaning silicon material

A silicon material and cleaning technology, which is applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems that impurities on the surface of silicon materials cannot be completely removed, and alleviate the shortage of silicon material resources. Effect

Inactive Publication Date: 2007-04-18
ZHEJIANG YUHUI SOLAR ENERGY SOURCE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The traditional cleaning process is to clean the impurities on the surface of the waste silicon material by washing. This method cannot ensure that the impurities on the surface of the silicon material are completely removed, and the silicon material it cleans is limited to large-area silicon wafers with regular shapes.

Method used

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  • Method for cleaning silicon material

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Embodiment Construction

[0020] Embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0021] Prepare an acid solution tank that contains hydrofluoric acid with a concentration of 40% and a nitric acid solution with a concentration of 65% in a ratio of 1:8 to form an acid solution, and immerse the waste silicon material in the above-mentioned mixed acid solution for 2 minutes . During this process, the silicon material reacts with the mixed acid solution, , the surface layer of the silicon material is completely corroded, and the metal impurities and organic dirt contained in the surface layer are removed; then, the silicon material treated with the acid solution is rinsed three times with pure water (deionized water), and the surface of the silicon material is further cleaned. The silicon material is soaked in the pure water tank, and the compressed air is bubbled to fully release the residual impurities of the silicon material. Th...

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Abstract

A cleaning method for removing the impurities from the surface of rejected Si material in order to reuse it includes such steps as immersing the rejected Si material in the mixed solution of hydrofluoric acid and nitric acid, flushing it with purified water several times, immersing it in purified water, measuring the electric conductivity of the immersing purified water, and baking.

Description

technical field [0001] The invention belongs to the technical field of cleaning treatment of semiconductor materials, in particular to a cleaning process for removing surface impurities from waste silicon materials. Background technique [0002] Silicon is a very important semiconductor material, which can be used to make diodes, triodes, light-emitting devices, pressure-sensitive components, solar cells and other components, and is widely used in radio engineering, automation, signal equipment, power engineering and other fields. However, as a non-renewable resource, silicon has a limited storage capacity. With the rapid development of modernization, the supply of silicon materials cannot meet the growing industrial demand. [0003] The technical requirements for the production of semiconductor components are relatively high. The manufacture of a silicon-containing semiconductor component often requires complex process procedures to complete, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/02B08B3/04C23G1/02
Inventor 吴云才
Owner ZHEJIANG YUHUI SOLAR ENERGY SOURCE
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