Methods and systems of offline measurement for process tool monitoring

A process and machine technology, applied in the offline measurement field of process machine monitoring, can solve problems affecting production quality, affecting productivity, and monitoring task loss, so as to improve efficiency and process, and reduce production loss.

Active Publication Date: 2007-06-20
TAIWAN SEMICON MFG CO LTD
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  • Abstract
  • Description
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Problems solved by technology

[0008] As mentioned above, as far as the current process machine monitoring method is concerned, when the monitoring tasks are improperly assigned based on experience, the monitoring tasks may be lost or the monitoring results may be ignored
Other disadvantages include that repeated assignment of monitoring tasks will affect productivity, insufficient monitoring tasks will affect production quality, and human judgment will affect machine quality

Method used

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  • Methods and systems of offline measurement for process tool monitoring
  • Methods and systems of offline measurement for process tool monitoring
  • Methods and systems of offline measurement for process tool monitoring

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Embodiment Construction

[0031] In order to make the purpose, features and advantages of the present invention more comprehensible, preferred embodiments are specifically cited below, together with the accompanying drawings, FIGS. 2 to 5 , for a detailed description. The description of the present invention provides different examples to illustrate the technical features of different implementations of the present invention. Wherein, the configuration of each element in the embodiment is for illustration, not for limiting the present invention. In addition, part of the symbols in the figures in the embodiments are repeated for the purpose of simplifying the description, and do not imply the relationship between different embodiments.

[0032] The embodiment of the present invention discloses a method and system for off-line measurement of process tool monitoring.

[0033] FIG. 2 is a schematic diagram showing the architecture of a quality control system according to an embodiment of the present inven...

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Abstract

The invention provides a method and a system of offline measurement for process tool monitoring. A self-tuning monitor rule database, storing predefined monitor rules for lot processing is provided. Monitor data related to the lot processing is defined. Desired monitor data is obtained according to selected monitor rules residing in the self-tuning monitor rule database. Offline measurement operations are implemented according to the obtained monitor data using a process tool to generate monitor results. It is determined whether abnormal states exist by comparing the selected monitor rules and monitor data according to the monitor results. If so, the lot processing for the process tool is terminated. If not, the lot processing for the process tool is allowed. A failure notice is sent in response and the selected monitor rules are re-defined to update the self-tuning monitor rule database. The invention can improve the efficiency and flow of the lot processing, reduce the loss of production.

Description

technical field [0001] The present invention relates to a semiconductor process control, and in particular to a method and system for off-line measurement of process tool monitoring. Background technique [0002] "Off-line measurement" is to use the measuring machine to measure the particles on the wafer, the thickness and the abnormal condition of the machine, which can adjust the state and setting of the machine to improve the process. The current offline measurement technology encounters the following difficulties. [0003] FIG. 1 is a schematic diagram showing a quality control system of a conventional semiconductor process tool. [0004] The quality control system 100 includes a data collection unit 110 and a constraint machine 130 . The data collection unit 110 is used for collecting process / tool ​​control and analysis data related to the semiconductor process. Traditionally, a monitor job (Monitor Job) 111 is determined based on engineer experience and monitoring r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B19/04G05B19/048
CPCG05B23/0297H01L22/20G05B19/41875Y02P90/02
Inventor 林志聪林水典
Owner TAIWAN SEMICON MFG CO LTD
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