Double heater and chemical vapor deposition process for preparing super conductive film therein

Abstract

The double heater apparatus includes one deposition chamber, one substrate heater fixed over the deposition chamber with one downwards substrate setting plane, one magnesium ingot heater connected to the lower inside of the deposition chamber with one upwards magnesium ingot setting plane, one air port to the deposition chamber and one vacuum pump. The apparatus of the present invention has simple structure, easy operation and low cost, and is used for chemical vapor deposition process preparing multilayer superconductive film with high homogeneity and great area for practical application.

Description

technical field

[0001] The invention relates to a superconducting film production device and a preparation process thereof, in particular to a double heating device and a process for preparing a multilayer superconducting film by a chemical vapor deposition method. Background technique

[0002] At present, there are many methods for preparing superconducting thin films, such as laser deposition, sputtering, molecular beam epitaxy, etc., but most methods can only prepare single-layer superconducting thin films, and single-layer superconducting thin films can generally only be used to prepare superconducting wires. , its use is relatively single, and the multilayer superconducting film can be used to make superconducting devices or integrated circuits, etc., and has a wide range of uses. Chinese Patent No. 03117799.9 discloses a "one-step process of double-heater in-situ chemical vapor deposition of magnesium boride superconducting film", which adopts a one-step method to prep...

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