[dynamic mask module]

Inactive Publication Date: 2005-04-21
NAT TAIWAN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0009] Therefore, the object of the present invention is to provide a dynamic mask module, which is adapted to generate dynamic mask patterns and applie

Problems solved by technology

The cost of mask depends on the resolution of line width; that is also the main reason that causes the high cost of mask.
Therefore, during the process loading and unloading masks increase process time.
Moreover, traditional g

Method used

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Embodiment Construction

[0022]FIG. 1 is a schematic drawing showing a preferred dynamic mask module of the present invention. Referring to FIG. 1, the dynamic mask module 100 comprises a microcomputer system 110; a mask pattern generator 120; and a light source 130. The mask pattern generator 120 is disposed over a substrate 10 and electrically connected to the microcomputer system 110. The microcomputer system 110 transmits an image signal of the mask pattern to the mask pattern generator 120 for generating pluralities of opaque areas and transparent areas and outputting the mask pattern. The light source 130 is, for example, ultraviolet or visible light, which is disposed over the mask pattern generator 120 and light of the light source 130 projects on the opaque areas and transparent areas for transferring the mask pattern to a photo-resist 12 on the substrate 10.

[0023] In order to minify and magnify the image of mask pattern, a focusing lens 140 is disposed between the mask pattern generator 120 and t...

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Abstract

A dynamic mask module is disclosed, which comprises a micro-computer system, a mask pattern generator and a light source. The mask pattern generator is disposed over a substrate and electrically connected to the microcomputer system. The microcomputer system transmits an image signal to the mask pattern generator. The light source is disposed over the mask pattern generator to a photo-resist layer on the substrate. The mask pattern generated by the dynamic mask module is a dynamic image and the mask pattern can be changed on anytime. In addition, the manufacturing cost can be and the manufacturing time can be reduced.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application claims the priority benefit of Taiwan application serial no. 92128666, filed Oct. 16, 2003. BACKGROUND OF INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a mask module, and more particularly to a dynamic mask module for generating dynamic mask patterns. [0004] 2. Description of the Related Art [0005] During semiconductor fabrication, photolithography is an essential process. Usually, whether a technology is complicate can be determined by the number of the lithographic process and mask. A mask is made from transparent glass and a patterned Cr layer is formed thereon. When a light source is applied thereto, the mask pattern can be transferred to the photo-resist on the substrate. [0006] For high resolution, uniformity of light, stability and quality of mask are key factors thereof. Traditionally, the mask patterns are taped out to the mask manufacturing companies for fabricating masks. ...

Claims

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Application Information

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IPC IPC(8): G03F1/68G03F7/00G03F7/20H01L21/027
CPCG03F7/0035G03F7/70291G03F7/2057H01L21/30
Inventor JENG, JENG-YWANWANG, JIA-CHANGSHEN, CHANG-HO
Owner NAT TAIWAN UNIV OF SCI & TECH
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