Particle-optical projection system

US20050201246A1Inactive Publication Date: 2005-09-15IMS NANOFABTION
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Patent Information

Authority / Receiving Office
US · United States
Current Assignee / Owner
IMS NANOFABTION
Publication Date
2005-09-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.
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Description

FIELD OF THE INVENTION AND DESCRIPTION OF PRIOR ART

[0001] The invention relates to the field of particle-optical projection systems and, in particular, to the adjustment of the image field position along the optical axis with the actual position of the target in a particle-optical projection system without a change of magnification or image quality. More in detail, the invention relates to the improvement of a particle-optical projection system for imaging a pattern onto a target by means of energetic electrically charged particles in a particle-beam exposure apparatus, adapted to produce, from the pattern positioned at an object plane and represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over, an image at the position of the target, with said image having a given size and distortion.

[0002] In systems of this kind, the Z-position of the image plane, i.e. the position as measured along the direction of the particle b...

Claims

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