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High density semiconductor memory and method of making

a high-density, semiconductor technology, applied in the direction of semiconductor devices, electrical equipment, transistors, etc., can solve the problems of increasing the cost of conventional 4 f memory cells, increasing the cost of manufacturing, and increasing the cost of additional equipment and processing steps

Inactive Publication Date: 2007-03-22
DOYLE DANIEL H
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

"The present invention provides an array of DRAM cells with cross-shaped active areas having polysilicon gate areas and capacitors. A buried digit line and word line are positioned orthogonally to each other and are electrically coupled with the polysilicon gate areas. The technical effects of this invention include a reduction in cell size, improved performance, and increased efficiency of the DRAM cells."

Problems solved by technology

While device density is, of course, limited by the resolution capability of available photolithographic equipment, it is also limited by the configuration of the individual memory cells used to make the memory ICs, and the corresponding areas of the memory cells.
Memory arrays having memory cell areas approaching 4 F2 require novel devices and are, therefore, more expensive to fabricate.
Additional equipment and processing steps drive up the costs of conventional 4 F memory cells.

Method used

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  • High density semiconductor memory and method of making
  • High density semiconductor memory and method of making
  • High density semiconductor memory and method of making

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first embodiment

[0048]FIG. 12 shows digit lines 340 added to the layout of FIG. 11. The digit lines 340 are offset from the laterally extending active area arms 165 by about ¼ F in the y direction. The offset of the digit lines 340 enables the digit lines 340, although buried, (see FIG. 13) to avoid the container-style stacked capacitor 335. Bit line contacts 380 couple the digit lines 340 with the active areas 160, as described with respect to the present invention. Word lines 370, depicted in cross-section in FIGS. 14 and 15, may be added to the layout, orthogonally to the digit lines 340, as illustrated in the previous embodiment of the invention of FIG. 7. The word lines 370 couple with the polysilicon gate areas 310 using word line contacts 350 (FIG. 15) positioned over the central region 316 of the polysilicon gate areas 310. Each bit line contact 380 couples four storage nodes 180 of an active area 160 with a digit line 340. Each word line contact 350 couples four neighboring storage nodes 1...

embodiment 41

[0063] A refresh counter 82 stores the address of the row of memory cells to be refreshed either during a conventional auto-refresh mode or self-refresh mode. After the row is refreshed, a refresh controller 84 updates the address in the refresh counter 82, typically by incrementing or decrementing, the contents of the refresh counter 82 by one. Although shown separately, the refresh controller 84 may be part of the control logic circuit 66 in other embodiments of the memory circuit 60. The memory circuit 60 may also include an optional charge pump 86, which steps up the power-supply voltage VDD to a voltage VDDP. In one embodiment 41, the charge pump 86 generates VDDP approximately 1-1.5 V higher than VDD. The memory circuit 60 may also use VDDP to conventionally overdrive selected internal transistors.

[0064]FIG. 17 is a block diagram of an electronic system 1212, such as a computer system, that incorporates the memory circuit 60 of FIG. 16. The system 1212 also includes computer c...

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Abstract

A memory cell, array and device include cross-shaped active areas and polysilicon gate areas disposed over arm portions of adjacent cross-shaped active areas. The polysilicon gate areas couple word lines with capacitors associated with each arm portion of the cross-shaped active areas. Buried digit lines are coupled to body portions of the cross-shaped active areas. The word lines and digit lines provide a unique contact to each capacitor of the array of memory cells. Each memory cell has an area of 5 F2. An electronic system and method for fabricating a memory cell are also disclosed.

Description

CROSS-REFERENCE TO RELATED APPLICATION [0001] This application is a divisional of application Ser. No. 11 / 089,890, filed Mar. 25, 2005, pending.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to semiconductor memories in general and, more particularly, to an improved dynamic random access memory (DRAM) and method for making such a DRAM wherein a cross-shaped active area enables cells of the DRAM to be packed more densely, reducing memory cell size. [0004] 2. Background of Related Art [0005] Random access memory (“RAM”) cell densities have increased dramatically with each generation of new designs and have served as one of the principal technology drivers for ultra large scale integration (“ULSI”) in integrated circuit (“IC”) manufacturing. However, in order to accommodate continuing consumer demand for integrated circuits that perform the same or additional functions and yet have a reduced size as compared with available circuits, ci...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L29/94H10B12/00
CPCH01L27/0207H01L27/10891H01L27/10885H01L27/10882H10B12/48H10B12/488H10B12/482
Inventor DOYLE, DANIEL H.
Owner DOYLE DANIEL H