Method and device for measuring and correcting aberrations of eye

Abstract

A device and method for measuring and correcting eye aberrations integrate wavefront sensing, wavefront aberration correction and optometric testing into one another and configure the optical paths of wavefront sensing and optometric testing as aplanatic structures, such that under optometric testing conditions both wavefront sensing and aberration correction can be performed simultaneously, and final optometric testing is conducted on wavefront aberration-corrected optometric parameters to verify if the wavefront aberration-corrected optometric parameters fall within normal visual range, thus ensuring the accuracy and high repetition of the measured optometric parameters.

Description

FIELD OF THE INVENTION [0001] The present invention is related to a method and device for measuring and correcting aberrations of an eye, more specifically, a method and device for measuring and correcting aberrations of an eye before / during / after laser ophthalmic surgery. BACKGROUND [0002] Wavefront technique developed by the National Aeronautics and Space Administration (NASA) was initially applied in the field of space technology. Astronomers use wavefront analysis to process aberrations produced by the atmosphere in order to obtain relatively accurate data and images of the Galaxy. At present, this epochal technique is applied in the field of human vision measurement. Light entering the eye has to pass through several structures before arriving eventually at the retina to form visual images. However, refractive index and structure of the eye varies. Shapes of these structures also affect the propagation path of light entering the eye. Due to these and other factors, the so-calle...

AI Technical Summary

Benefits of technology

[0021] The device and method for measuring and correcting eye aberrations of the present invention allow wavefront sensing, wavefront aberration correction, and optometric testing to be integrated with each other, and allow the optical paths of wavefront sensing and optometric testing to be configured as aplanatic structures, such that under optometric testing conditions both wavefront sensing and aberration correction can be performed simultaneously, and final optometric te

Problems solved by technology

Upon entry of parallel light into the eye with aberrations, the wavefront of the light reflected from the retina may be distorted due to irregular structures of the eye, causing images to be blurred, scattered, dragged and etc.

However, such elements do have their own disadvantages, namely bulky and expensive, thus failing to meet the need for miniaturization and popularity of the eye aberration measuring devices.

However, this kind of wavefront measuring device does not optimize measurement and correction, resulting in great uncertainty of aberration measurement.

In addition, a target object seen by an eye undergoing measurement and the optical path of the measuring device are independent of each other, and thus the difference of optometric parameters before and after aberration correction cannot be accurately determined.

However

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