Method of forming diffraction grating and method of fabricating distributed feedback laser diode

a laser diode and diffraction grating technology, which is applied in the field of forming diffraction gratings and fabricating distributed feedback laser diodes, can solve the problems of affecting the accuracy of diffraction gratings, and affecting the quality of diffraction gratings, so as to achieve accurate transfer, reduce the viscosity, and facilitate the effect of movement into the r
US20100081224A1Active Publication Date: 2010-04-01SUMITOMO ELECTRIC IND LTD
2 Cites 11 Cited by

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
SUMITOMO ELECTRIC IND LTD
Publication Date
2010-04-01

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

A method of forming a diffraction grating according to the present invention includes a step of preparing a mold having projections and recesses for forming a diffraction grating, a step of bringing the projections and recesses of the mold into contact with a resin layer in a chamber at a first pressure less than atmospheric pressure, a step of setting a pressure in the chamber to a second pressure more than the first pressure while maintaining the contact, and a step of hardening the resin layer while maintaining the contact between the resin layer and the projections and recesses so as to form a pattern for the diffraction grating on the hardened resin layer. The recesses in the projections and recesses of the mold form a closed pattern in the plane of the mold including the projections and recesses.
Need to check novelty before this filing date? Find Prior Art

Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a method of forming a diffraction grating and a method of fabricating a distributed feedback laser diode.

[0003] 2. Description of the Related Art

[0004] To date, a nano-imprint technique has been known in which a mold having a predetermined pattern is pressed against a resin layer so that the pattern is transferred to the resin layer, and using the resin layer as a mask, the pattern is formed on a semiconductor surface. Non-Patent Reference 1 (Stephen Y. Chou et al., “Nanoimprint lithography”, The Journal of Vacuum Science and Technology B, 14(6), November / December 1996, pp. 4129-4133) describes a method of forming a pattern for a diffraction grating, using a nano-imprint technique.SUMMARY OF THE INVENTION

[0005] When a mold is pressed against a resin layer in a nano-imprint technique, if the ratio of the width to depth (i.e., aspect ratio) of recesses in the pattern of the mold is relatively...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More