23 results about "Closed pattern" patented technology

The present invention relates to a filter panel which is intended to be mounted in a drum filter, the filter panel comprising a peripheral frame to which a filter cloth is fixed, the frame being formed by two longitudinal members which are connected at each end by an end cross-member, characterized in that the filter panel comprises a lattice (R1) of crosspieces which connect the inner edges of the frame to one another, the lattice (R1) of crosspieces forming at least a first closed pattern (54) in the centre of the frame and comprising at least four diagonals which are inclined with respect to the longitudinal members and which extend from the first closed pattern to an inner edge of the frame.

The invention provides a temperature control assembly for a probe card and the probe card, and relates to the field of wafer testing. The temperature control assembly for the probe card comprises a cover plate; the heating assembly is arranged on the side, away from the probe card, of the cover plate, and the heating assembly is electrically connected with the testing machine table; the heating buffer assembly is arranged on one side, close to the probe card, of the cover plate; the heat preservation assembly is arranged on the side, close to the probe card, of the cover plate, and the heat preservation assembly is an assembly with a closed pattern and is distributed on the outer side of the probe card; wherein the cover plate, the heat preservation assembly and the probe card form a heat receiving space, and the orthographic projection of the heating assembly on the cover plate is within the orthographic projection of the heating buffer assembly and the heat preservation assembly on the cover plate. According to the embodiment of the invention, the probe mark offset caused by temperature difference generated by heating of the probe card in the test process can be avoided, so that the test efficiency can be improved.

An diffraction grating comprises: a substrate; and a plurality of micro-structure units, which are formed on the substrate and are periodically arranged at intervals in a first dimension direction (p1) and a second dimension direction (p2). A pattern formed by the orthographic projections of the micro-structure units on the substrate comprises a first closed pattern, wherein the first closed pattern is an asymmetric pattern, the boundary of the first closed pattern is formed by sequentially connecting three or more edges in a surrounding manner, and among the three or more edges, there is at least one straight-line edge, which is neither parallel to the first dimension direction (p1) nor to the second dimension direction (p2).

Provided are a diffraction grating, an optical waveguide apparatus including the diffraction grating and a display device including the diffraction grating. The diffraction grating includes a substrate and microstructure units. The microstructure units are formed on the substrate and arranged at intervals in two dimensional directions. A pattern formed by the orthographic projection of a microstructure unit on the substrate includes a first closed pattern. The boundary of the first closed pattern is formed by a smooth closed curve such that the boundary has no sharp vertices. At least a first curve segment having a negative radius of curvature is present on the boundary such that at least one valley is formed on the boundary.

The present application relates to the technical field of printed circuit boards, and provides a differential signal transmission circuit, a circuit board, an electronic device, and a circuit manufacturing method. For the differential signal transmission circuit, the following is formed on a surface layer of a circuit board: a peripherally closed pattern, a first pattern, a second pattern, and a third pattern; the first pattern, the second pattern, and the third pattern are all surrounded by the peripherally closed pattern; the first pattern, the second pattern, and the third pattern are isolated by a dielectric; the first pattern and the second pattern are axisymmetric; the first pattern and the second pattern are respectively connected to an inner signal layer by means of an inner wall plating layer of the circuit board; and the third pattern is used to form a return current path.

The invention provides a visual monitoring method, device and system for mold processing and a storage medium, and relates to the technical field of industrial software. The method comprises the steps of obtaining line segment coordinate information in a mold graph; performing closed pattern recognition according to the line segment coordinate information to obtain a heating area and a corresponding heating area coordinate array; mapping the heating areas and the heating area coordinate array to a graphical interface, drawing a graph of the heating areas in the graphical interface according to the heating area coordinate array, and assigning a corresponding temperature interface for each heating area; acquiring temperature data of each heating area according to the temperature interface; according to the temperature data of each heating area, the color of the graph of each heating area is dynamically rendered in the graphical interface, so that the problem that an existing electric heating system cannot directly import and recognize the mold graph can be solved, and the temperature monitoring efficiency is improved.

A method for manufacturing a Josephson junction, including a provision of a substrate, a formation of a first superconductor layer, a formation of a barrier layer, a structuration of the barrier layer to form a closed pattern and an open pattern, a formation of a second superconductor layer, an etching of the second superconductor layer, configured to form vias by stopping on the barrier layer, and an etching of the first superconductor layer on either side of the closed pattern and of the open pattern, configured to form lines.

The application relates to the technical field of display, and provides a photomask, a metal mask and a preparation method, which comprise a pattern definition region, the pattern definition region is used for defining a pixel opening region of the metal mask, the pattern definition region is a closed pattern composed of four inner concave arcs and a round corner connecting the inner concave arcs, the pixel opening region is a round-cornered rectangle, the center of the pattern definition region is coincident with the center of the pixel opening region, and the area of the pattern definition region is smaller than the area of the pixel opening region. The pattern of the pattern definition region transferred on the metal mask can make the liquid medicine more uniformly distributed on the whole surface, effectively reduce the formation of vortex and dead zones, avoid the liquid medicine to be retained in local areas, thereby reducing the problems of impurity accumulation and incomplete reaction, reducing the etching inconsistency caused by uneven flow, and improving the etching uniformity of the round corners and the etching uniformity of the straight edges of the pixel opening region of the metal mask.

The invention relates to a processing method of a single-sided adhesive roll material convenient to strip, which comprises the following steps of: sequentially laminating an original film, a silica gel protective film and a protective film from top to bottom to obtain a primary material belt; an original film of the first-stage material belt is punched along an original film die cutting line, a second-stage material belt is obtained, and a plurality of closed patterns are formed on the original film die cutting line; a single-sided adhesive and an auxiliary material release film are sequentially attached to the second-stage material belt, and a third-stage material belt is obtained; the third-stage material belt is subjected to single-sided adhesive punching along a product die cutting line, a fourth-stage material belt is obtained, the product die cutting line is matched with the contour line of the single-sided adhesive roll material product, and the shape of the product die cutting line partially coincides with the closed pattern formed by the original film die cutting line; a carrier tape release film is attached to the fourth-stage material tape, and a fifth-stage material tape is obtained; and S6, the silica gel protective film is punched on the fifth-level material belt along the trimming line, third outline waste and the protective film are discharged, and a single-sided adhesive roll material product is obtained through rolling. Compared with the prior art, the single-sided adhesive and the carrier tape release film are well stripped, and the use efficiency of automatic equipment is improved.

The utility model discloses cloth laser slitting processing equipment, and aims to provide the cloth laser slitting processing equipment which is good in universality and capable of cutting various closed patterns with different shapes and different sizes; and the cloth is tensioned and fixed conveniently and quickly, so that the production efficiency is improved, and the cloth laser slitting processing equipment is suitable for the requirement of production takt. The cloth conveying unit keeps the shape of cloth and drives the cloth to move along a straight line at a set speed; the laser slitting unit is used for slitting the cloth on the cloth conveying unit according to a preset track; and the negative pressure device is used for providing negative pressure holding force for the cloth held on the surface of the cloth conveying unit, so that the cloth moves in a set form.

The present application relates to a semiconductor structure and a method for forming the same, the semiconductor structure comprising: a first substrate, a surface of the first substrate having a patterned region, a device pattern being formed in the patterned region; a second substrate, the second substrate being bonded to the surface of the first substrate by a support structure, the support structure being bonded to the first substrate and / or the second substrate by an adhesive, the support structure being arranged around the patterned region such that a cavity is formed between the first substrate and the second substrate, the patterned region being located in the cavity; the surface of the first substrate further having a barrier dam structure located in the cavity, the barrier dam structure having a certain height, the barrier dam structure being located between the support structure and the patterned region, the barrier dam structure being in a closed pattern and being arranged around the patterned region to block the adhesive overflowing from between the first substrate and the second substrate. The performance of the semiconductor structure is not affected by the adhesive overflow during the bonding process.

This invention discloses a laser slitting system and a dynamic slitting method for closed shapes, aiming to provide a laser slitting system and a dynamic slitting method for closed shapes that can be achieved using fewer laser slitting units. The laser slitting system includes a fabric conveying unit, laser slitting units, and a controller. The dynamic slitting method for closed shapes includes the following steps: dividing the fabric on the fabric conveying unit into at least two slitting areas; determining the laser slitting path, with each laser slitting unit corresponding to one slitting area, and determining the laser slitting path of each laser slitting unit within its corresponding slitting area, the laser slitting paths of all laser slitting units collectively forming a closed shape; the fabric conveying unit driving the fabric along a straight line at a set speed, and each laser slitting unit cutting the fabric along the laser slitting path during the fabric movement.

The machine shell assembly comprises a front shell part and a rear shell part, the front shell part comprises an air outlet frame assembly and a front shell which are detachably connected, an air outlet is formed in the air outlet frame assembly, the air outlet frame assembly is installed on the front shell, a first connecting structure is arranged on the air outlet frame assembly, and a second connecting structure is arranged on the front shell. The first connecting structure and the second connecting structure are detachably connected and jointly define at least one closed pattern, and the rear shell component is connected to the rear side of the front shell component and forms an air inlet. According to the machine shell assembly, the first connecting structure and the second connecting structure jointly define at least one closed pattern, and the connecting structure of the closed pattern can enable the air outlet frame assembly and the front shell to form a stable structure which supports and restricts each other. The connecting strength and rigidity between the side edge of the air outlet frame assembly and the side edge of the front shell can be improved, so that deformation of the side edge of the air outlet frame assembly or the side edge of the front shell is effectively reduced.

The invention relates to a filter panel (12) intended to be installed in a cartridge filter (10), the filter panel (12) comprising a peripheral frame (32) to which a filter cloth (34) is fixed, the frame (32) being formed by two side members (36, 38) connected at each end by end transverse members (40, 42), characterized in that the filter panel (12) comprises an array (R1) of crossbars (44) connecting the inner edges (46, 48, 50, 52) of the frame (32) to each other, the array (R1) of crossbars (44) forming at least one first closed pattern (54) in the center of the frame (32) and comprising at least four diagonal lines (64, 66, 68, 70, 72, 74, 76, 78) which are inclined with respect to the side members (36, 38) and which extend from the first closed pattern (54) to the inner edges (46, 48, 50, 52) of the frame (32).

This invention provides a display substrate and a display device. The display substrate includes a display area and a notch area, the notch area and the display area together forming a closed pattern, wherein the notch area is located at the edge of the closed pattern. The display area includes a first area adjacent to the notch area and a second area excluding the first area. The display substrate includes a low-level signal line disposed within the first area, the low-level signal line being used to receive a preset signal and forming a capacitance with the traces within the first area to increase the load capacitance of the traces. The display substrate and display device provided by this invention can ensure the display effect of the display device.

To provide a cosmetic which is provided together with a container having a mesh-like sheet base material as a screen, can suppress leakage and overflow of a cosmetic composition from the sheet base material, and can exhibit improved long-lasting makeup characteristics.SOLUTION: Provided is a cosmetic provided with a container, wherein the container comprises a body configured to contain a cosmetic composition, and a screen comprising a mesh-like sheet substrate having a plurality of openings, wherein the sheet substrate has a closed pattern composed of at least one closed domain at least partially closing the plurality of openings, and wherein the cosmetic composition comprises (a) at least one mineral-based lipophilic thickener, (b) at least one silicone elastomer, and (c) at least one filler.SELECTED DRAWING: Figure 1

This invention discloses a method for fabricating an air bridge and a quantum chip. The method includes: providing a substrate with a first photoresist layer; forming at least three vias on the first photoresist layer, with their center points sequentially connected to form a closed pattern; forming a first metal structure filling each via, and removing the first photoresist layer; forming a second photoresist layer flush with the surface of the first metal structure on the substrate, and forming a third photoresist layer covering the second photoresist layer, forming an opening on the third photoresist layer exposing the entire first metal structure; forming a second metal structure connected to the entire first metal structure within the opening; and removing the second and third photoresist layers to obtain the air bridge. Because there are at least three piers, and all piers support the bridge deck, the structural strength is enhanced, thereby improving the structural stability of the air bridge. Structural damage is less likely during photoresist removal, and the air bridge is less prone to collapse after photoresist removal.

The present disclosure relates to a semiconductor structure and a method for manufacturing the same. The method comprises: forming a plurality of first trenches in a substrate, the first trenches being arranged in parallel and spaced apart, and extending along a first direction; forming support structures filling the first trenches; forming a mask structure above the substrate, the mask structure comprising a plurality of mask bridges arranged in parallel and spaced apart, the mask bridges extending along a second direction, the second direction intersecting the first direction, a projection of adjacent mask bridges on a surface of the substrate and a corresponding adjacent support structure forming a closed pattern, and a space between the adjacent mask bridges exposing a part of a top surface of the support structures; etching the substrate and the support structures based on the mask structure to form second trenches; removing the support structures to make the first trenches and the second trenches communicate as isolation trenches; and forming isolation structures filling the isolation trenches, the isolation structures separating a plurality of active regions in the substrate. The present disclosure can reduce or eliminate the bridging defects of the active regions, and facilitate improving the production yield and reliability of semiconductor devices.

This invention belongs to the field of semiconductor device manufacturing and layout design technology. It provides a layout connection structure design method to improve the metal stripping process of indium gallium arsenide (IGaAs) detectors. The method employs an inverted trapezoidal stepped electrode edge optimization, forming a gradual slope along the direction perpendicular to the substrate. Rounded transitions are used at the corners of the electrode pattern. Small closed patterns to be stripped are connected to surrounding large patterns via connecting strips. The inverted trapezoidal slope of the connecting strips matches the electrode pattern. The connecting strips avoid the effective area of ​​the detector, with a minimum distance of ≥4µm from the effective electrode. The number of connecting strips is set according to the minimum area pattern distribution density, with one connecting strip shared by every 2-5 small closed patterns. This reduces contaminant generation by more than 98%, fundamentally lowering the risk of electrode contamination and scrapping. It is directly compatible with existing Ti / Pt / Au multilayer metal stripping processes. The connecting strip parameters can be flexibly adjusted according to different electrode sizes, making it suitable for detector production in various fields such as optical communication and spectral detection.

A method for manufacturing an FeMFET device may include: a providing a transistor including a gate, a source, and a drain connected to vias; forming a first metal layer; forming a ferroelectric layer; structuring the ferroelectric layer to form a closed pattern surmounting the gate and open patterns surmounting the vias; forming a second metal layer; etching the second metal layer, configured to form vias by stopping on the ferroelectric layer; and etching the first metal layer on either side of the closed pattern and of the open patterns, configured to form lines.

The present invention relates to a diffraction grating (10) and an optical waveguide element and display device including the diffraction grating (10). The diffraction grating (10) comprises a substrate (1) and a plurality of microstructure units (2) formed on the substrate (1) so as to be periodically spaced apart in a first dimension (p1) and a second dimension (p2). The pattern formed by the orthogonal projection of the microstructure units (2) onto the substrate (1) includes a first closed pattern (21), the first closed pattern (21) being an asymmetric pattern, where three or more edges are sequentially connected to form a closed boundary, and at least one of the three or more edges is a straight edge that is not parallel to either the first dimension (p1) or the second dimension (p2). Thus, the microstructure units (2) JPEG2026514601000026.jpg11 has many adjustable parameters, offering a high degree of design flexibility and advantages in adjusting light extraction efficiency.

The embodiment of the utility model provides a composite wallboard assembly and an outer wall structure, and relates to the field of buildings. The connecting frame is encircled to form a closed pattern, and the connecting frame is fixed on the first wall surface of the wallboard; the filling structure has a heat preservation function and is fixed to the first wall face, the filling structure is partially contained in the space defined by the connecting frame, and the portion, located in the space, of the filling structure makes contact with the connecting frame. The composite wallboard assembly is applied to the outer wall structure, and the composite wallboard assembly can make fixed connection between a filling structure and a wallboard more reliable.