Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Inositol hexakisphosphate analogs and uses thereof

a technology of inositol hexaphosphate and analogs, which is applied in the field of microorganisms, pharmaceutical chemistry and antibiotic formulations, can solve the problems of high disease burden, high risk of surgical and anesthesia complications, and patients with severe i>c. difficile /i>infection are typically elderly, and do not confer protection against toxin activity

Inactive Publication Date: 2012-10-11
BOARD OF RGT THE UNIV OF TEXAS SYST
View PDF1 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0019]The present invention also is directed to a method for neutralizing a pathogenic Clostridium difficile bacteria toxin. The method comprises contacting the C. difficile bacteria or toxin with the compounds described herein, where the compound potentiates or inhibits cysteine-dependent toxin self-cleavage, thereby neutralizing the same.
[0020]The present invention is directed further to a method of treating a pathogenic Clostridium difficile infection in a

Problems solved by technology

By contrast, in hospitalized adults taking antibiotics, the rate of colonization increases substantially to 20-40%, and is associated with a high disease burden.
However, patients with severe C. difficile infection are typically elderly, critically ill, and are at high risk for surgical and anesthetic complications.
However, it did not confer protection against toxin activity, and the length of hospitalization was not significantly reduced.
Other options, such as probiotics and anion-exchange resins, have limited efficacy and are potentially harmful.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Inositol hexakisphosphate analogs and uses thereof
  • Inositol hexakisphosphate analogs and uses thereof
  • Inositol hexakisphosphate analogs and uses thereof

Examples

Experimental program
Comparison scheme
Effect test

example 1

Allosteric Activation of TcdA and TcdB Autocleavage

[0052]In order to better understand how InsP6 allosterically activates TcdA and TcdB autocleavage, cysteine protease domain homology models were generated that included the uncut N-terminus substrate cleavage fragment within the P1-substrate residue catalytic cleft (FIG. 1). These studies have identified a reaction mechanism in response to conformational-coupling by InsP6. Analysis of these N-terminus extended cysteine protease domain models demonstrated an extensive network of interconnecting hydrogen bonds within the catalytic active site. Because of the unusually large distances (>6 Å) between the catalytic cysteine and histidine in all of the microbial cysteine protease domain crystal structures, the histidine residue appears to play a role in substrate orientation within the P1 pocket rather than conferring nucleophilicity to the catalytic cysteine thiolate as conventionally happens in cysteine proteases. The aspartic acid may ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Compositionaaaaaaaaaa
Login to View More

Abstract

Provided herein are analog and derivative compounds of inositol hexakisphosphate effective to treat a Clostridium difficile infection and to neutralize the bacterial toxins produced by the same. In addition, methods of treating the C. difficile infection and for neutralizing its toxins with the compounds are provided.

Description

PRIORITY CLAIM[0001]This application claims priority to U.S. Provisional Patent Application Ser. No. 61 / 516,639 filed Apr. 6, 2011, which is incorporated herein by reference in its entirety.STATEMENT REGARDING FEDERALLY FUNDED RESEARCH[0002]This invention was made with government support under 1UL1RR029876-01 and DK078032-01 awarded by the John S. Dunn Gulf Coast Consortium for Chemical Genomics Robert A. Welch Collaborative Grant Program and NIDDK, respectively. The government has certain rights in the invention.BACKGROUND[0003]I. Field of the Invention[0004]The present invention relates generally to microbiology, pharmaceutical chemistry and antibiotic formulations. More specifically, the present invention relates to inositol hexakisphosphate analogs.[0005]II. Description of the Related Art[0006]Clostridium difficile is a Gram-positive, spore-forming anaerobic bacillus that is a common cause of nosocomial antibiotic-associated diarrhea and is the etiologic agent of pseudomembranou...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07F9/117C07F9/06C07F9/70A01P1/00A61P31/04A01N57/12A01N57/04C07F9/177A61K31/6615
CPCC07F9/117C07F9/70C07F9/06C07F9/177A61P31/04
Inventor SAVIDGE, TOR C.URVIL, PETRINAUDURI, DHAMANJAYAOEZGUEN, NUMANSCHEIN, CATHERINEBRAUN, WERNER
Owner BOARD OF RGT THE UNIV OF TEXAS SYST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com