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X-ray based evaluation of a status of a structure of a substrate

Active Publication Date: 2021-02-04
APPL MATERIALS ISRAEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent is about a method and system for using x-rays to evaluate the status of a structure on a substrate. The method involves acquiring an electron image and an x-ray image of the structure using charged particle optics, and then evaluating the status of the structure based on the number of x-ray photons emitted from it. This approach provides a non-destructive and non-invasive way to inspect the structure of a substrate.

Problems solved by technology

It is hard to evaluate structures such as deep holes and deep trenches.

Method used

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  • X-ray based evaluation of a status of a structure of a substrate
  • X-ray based evaluation of a status of a structure of a substrate
  • X-ray based evaluation of a status of a structure of a substrate

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Embodiment Construction

[0012]In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the one or more embodiments of the disclosure. However, it will be understood by those skilled in the art that the present embodiments may be practiced without these specific details. In other instances, well-known methods, procedures, and components have not been described in detail so as not to obscure the present one or more embodiments of the disclosure.

[0013]The subject matter regarded as the one or more embodiments of the disclosure is particularly pointed out and distinctly claimed in the concluding portion of the specification. The one or more embodiments of the disclosure, however, both as to organization and method of operation, together with objects, features, and advantages thereof, may best be understood by reference to the following detailed description when read with the accompanying drawings.

[0014]It will be appreciated that for simplic...

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Abstract

A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

Description

BACKGROUND OF THE INVENTION[0001]It is hard to evaluate structures such as deep holes and deep trenches. Deep may mean having a depth that may exceed a few micron, for example three microns. Secondary electrons and backscattered electrons emitted from the bottom of such structures fail to exit from the structures.[0002]There is a growing need to provide an efficient, fast, and reliable way to evaluate the status of such structures.BRIEF SUMMARY OF THE INVENTION[0003]Some embodiments of the disclosure pertain to a method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.[0004]Some embodiments provided a computer readable medium that is not transitory and stor...

Claims

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Application Information

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IPC IPC(8): G01N23/2252G01N23/2206
CPCG01N23/2252G01N23/2206G01N23/04G01N23/225G01N23/2208G01N23/083G01N23/18G01B15/04
Inventor SHEMESH, DROR
Owner APPL MATERIALS ISRAEL LTD
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