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2348results about How to "Promote crystallization" patented technology

Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device

An object of the present invention is to provide a method for easily forming a polycrystalline semiconductor thin-film, such as polycrystalline silicon having high crystallinity and high quality, or a single crystalline semiconductor thin-film at inexpensive cost, the crystalline semiconductor thin-film having a large area, and to provide an apparatus for processing the method described above. In forming a polycrystalline (or single crystalline) semiconductor thin-film (7), such as a polycrystalline silicon thin-film, having high crystallinity and a large grain size on a substrate (1), or in forming a semiconductor device having the polycrystalline (or single crystalline) semiconductor thin-film (7) on the substrate (1), a method comprises forming a low-crystallization semiconductor thin-film (7A) on the substrate (1), and subsequently heating and cooling this low-crystallization semiconductor thin-film (7A) to a fusion, a semi-fusion, or a non-fusion state by flash lamp annealing to facilitate the crystallization of the low-crystallization semiconductor thin-film, whereby a polycrystalline (single crystalline) semiconductor thin-film (7) is obtained. A method for forming the semiconductor device and an apparatus for processing the methods are also disclosed.
Owner:SONY CORP

Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device

An object of the present invention is to provide a method for easily forming a polycrystalline semiconductor thin-film, such as polycrystalline silicon having high crystallinity and high quality, or a single crystalline semiconductor thin-film at inexpensive cost, the crystalline semiconductor thin-film having a large area, and to provide an apparatus for processing the method described above. In forming a polycrystalline (or single crystalline) semiconductor thin-film (7), such as a polycrystalline silicon thin-film, having high crystallinity and a large grain size on a substrate (1), or in forming a semiconductor device having the polycrystalline (or single crystalline) semiconductor thin-film (7) on the substrate (1), a method comprises forming a low-crystallization semiconductor thin-film (7A) on the substrate (1), and subsequently heating and cooling this low-crystallization semiconductor thin-film (7A) to a fusion, a semi-fusion, or a non-fusion state by flash lamp annealing to facilitate the crystallization of the low-crystallization semiconductor thin-film, whereby a polycrystalline (single crystalline) semiconductor thin-film (7) is obtained. A method for forming the semiconductor device and an apparatus for processing the methods are also disclosed.
Owner:SONY CORP

Systems and methods for inducing crystallization of thin films using multiple optical paths

The present invention is directed to systems and methods for irradiating regions of a thin film sample(s) with laser beam pulses having different energy beam characteristics that are generated and delivered via different optical paths. Exemplary methods include the steps of generating a plurality of laser beam pulses having energy beam characteristics, directing a generated laser beam pulse onto a first optical path, modulating the energy beam characteristics of the first optical path-directed laser beam pulse, irradiating at least a portion of a first region of the thin film with the first optical path-directed laser beam pulse to induce crystallization of the portion of the first region, directing a generated laser beam pulse onto a second optical path, modulating the energy beam characteristics of the second optical path-directed laser beam pulse, wherein the energy beam characteristics of the second optical path-directed laser beam pulse is different from the energy beam characteristics of the first optical path-directed laser beam pulse, and irradiating at least a portion of a second region of the thin film with the second optical path-directed laser beam pulse to induce crystallization of the portion of the second region. An exemplary system includes a first optical path, a second optical path, a beam steering element for directing laser beam pulses onto the first optical path and the second optical path; and a handling stage for controlling the position of a thin film relative to the laser beam pulses being directed via the first and second optical paths.
Owner:THE TRUSTEES OF COLUMBIA UNIV IN THE CITY OF NEW YORK

Systems and methods for inducing crystallization of thin films using multiple optical paths

The present invention is directed to systems and methods for irradiating regions of a thin film sample(s) with laser beam pulses having different energy beam characteristics that are generated and delivered via different optical paths. Exemplary methods include the steps of generating a plurality of laser beam pulses having energy beam characteristics, directing a generated laser beam pulse onto a first optical path, modulating the energy beam characteristics of the first optical path-directed laser beam pulse, irradiating at least a portion of a first region of the thin film with the first optical path-directed laser beam pulse to induce crystallization of the portion of the first region, directing a generated laser beam pulse onto a second optical path, modulating the energy beam characteristics of the second optical path-directed laser beam pulse, wherein the energy beam characteristics of the second optical path-directed laser beam pulse is different from the energy beam characteristics of the first optical path-directed laser beam pulse, and irradiating at least a portion of a second region of the thin film with the second optical path-directed laser beam pulse to induce crystallization of the portion of the second region. An exemplary system includes a first optical path, a second optical path, a beam steering element for directing laser beam pulses onto the first optical path and the second optical path; and a handling stage for controlling the position of a thin film relative to the laser beam pulses being directed via the first and second optical paths.
Owner:THE TRUSTEES OF COLUMBIA UNIV IN THE CITY OF NEW YORK

Lithium iron phosphate-carbon nanotube composite material, preparation method, and application thereof

ActiveCN102427130AThe phase is pure and the crystal form is goodLow resistivityCell electrodesLithium iron phosphateCarbon nanotube
The present invention discloses a lithium iron phosphate-carbon nanotube (LiFePO4-CNTs) composite material. The composite material comprises LiFePO4 particles, a nano-carbon layer and CNTs, wherein the nano-carbon layer is positioned outside the LiFePO4 particles, and the CNTs grow in the nano-carbon layer in an in situ growth manner by a chemical vapor deposition (CVD) process. In addition, the present invention further discloses a preparation method for the composite material. The method comprises: uniformly mixing and coating the prepared LiFePO4 precursor powder, a catalyst and liquid carbon source to prepare into the slurry; adopting a spraying feeding device to convey the slurry to a high-temperature reaction furnace to form a floating CVD process; carrying out heat insulation calcination for the resulting mixture so as to complete the treatments of granulation of the LiFePO4 precursor, in situ growth and coating of the CNTs and synthesis sintering of the LiFePO4 in one step, such that the uniform nano-carbon layer and the CNTs are formed on the surfaces of the LiFePO4 particles. In addition, the present invention further discloses an application of the composite material in battery preparation. According to the composite material of the present invention, the nano-carbon layer and the CNTs have good crystallization, the total carbon content is low, the electrical conductivity and the specific capacity are high so as to substantially increase the rate performance.
Owner:HUBEI RT ADVANCED MATERIALS CO LTD

Method for synthesizing LiFePO4/C material based on chemical gas phase sediment auxiliary solid phase method

The invention relates to a method for synthesizing LiFePO4/C material by chemical vapor deposition supporting the solid phase reaction method, namely, the method for preparing carbon coating lithium iron battery anode material, belonging to the Li-ion battery material preparation art technical field. The characteristics of the method for synthesizing LiFePO4/C materials by solid phase and auxiliary chemical vapor deposition are that auxiliary chemical vapor deposition supporting the solid phase reaction method is adopted to synthesize the carbon coating phosphate lithium iron, namely, the LiFePO4/C material. In the method for synthesizing LiFePO4/C material by chemical vapor deposition supporting the solid phase reaction method, a precursor comprising raw materials of lithium, iron and phosphor is adopted to prepare the carbon coating phosphate lithium iron after being blended, grinded by a globe mill, treated by preheating and calcined as well as vapor deposition. The method for synthesizing LiFePO4/C material by chemical vapor deposition supporting the solid phase reaction method has the advantages that the chemical composition, carbon contents and grain size of LiFePO4 can be controlled effectively; the Li-ion battery anode material prepared has sound conductive performance and can improve the charge-discharge rate and cycling performance of the material.
Owner:SHANGHAI CHIYUAN NEW MATERIAL TECH
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