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Nanostructures

A nano-scale, particle-based technology that is used in the formation of small-scale structures and can solve problems such as difficult geometric features

Inactive Publication Date: 2007-09-05
QUNANO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Forming the individual geometric features of these devices at sufficient resolution becomes difficult as dimensions decrease due to the need to expose the photoresist using shorter-than-ever-before-wavelength irradiation

Method used

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Embodiment Construction

[0042] Description of preferred embodiments

[0043] Referring now to Figure 1 of the drawings, the surface of a silicon wafer 3 is oxidized to form a silicon dioxide layer 1 and negatively charged localized regions 5 are imprinted on the surface. With the aid of the local electric field F, the nanoparticles 7 formed in the aerosol cells are positively charged and attracted to the locally charged regions 5 of the silica surface layer.

[0044] Figures 2a to 2c illustrate a method of applying a local charge to a surface. A nanoprinting stamp 9 is made of a conductive material (or an insulating material with a metal coating on its surface) and brought into contact with the insulating surface 1 . The stamp 9 has protrusions 11 of a predetermined configuration on its contact surface. The width of these protrusions can vary from the nanometer scale to the macroscopic millimeter scale, preferably produced by electron beam lithography. The height of the protrusions is not critical...

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Abstract

A fast method of creating nanostructures comprising the steps of forming one or more electrically-charged regions ( 5 ) of predetermined shape on a surface ( 1 ) of a first material, by contacting the regions with a stamp for transferring electric charge, and providing electrically charged nanoparticles ( 7 ) of a second material, and permitting the particles to flow in the vicinity of the regions, to be deposited on the regions.

Description

technical field [0001] The present invention relates to a method of forming small scale structures, eg nanoscale - commonly known as nanostructures, and also to a method of interaction of small particles, especially nanoscale particles, with the surface of a material. Background technique [0002] So far, small-sized photonic or electronic devices have been fabricated using photolithographic processing technology. Forming the individual geometric features of these devices with sufficient resolution becomes difficult as dimensions decrease due to the need to expose the photoresist using ever shorter wavelengths of illumination. [0003] In the author is Chu et al., published in Applied Physics Letters 67 (21), November 20, 1995, page 3114-3116 "imprint of via hole and groove below 25nm in the polymer (Imprint of sub-25nm vias and trenches in polymers)" discloses a process that presses a stamp into a thermoplastic polymer film on a substrate to produce vias and trenches with ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00G03F7/20B05D1/04B82B3/00B05D1/00H01L21/28H01L49/00H10B69/00
CPCB82Y10/00H01L21/28273B05D1/007B82Y40/00G03F7/0002H01L49/006H01L29/40114H10N99/05G03F7/00B82B1/00B82B3/00
Inventor K·W·德佩尔特C·M·H·马努松L·I·萨米尔松T·J·克林克
Owner QUNANO