Liquid crystal display picture element structure and manufacturing method thereof and liquid crystal display panel
A liquid crystal display and pixel structure technology, which is applied in semiconductor/solid-state device manufacturing, static indicators, instruments, etc., can solve the problems of lower pass rate and lower production capacity, and achieve the effects of increasing production capacity, reducing costs, and reducing the number of masks
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 example
[0022] figure 1 is a schematic top view of one of the pixel structures of the liquid crystal display according to the first embodiment of the present invention, Figure 2A to Figure 2H It is a schematic cross-sectional view of the manufacturing process of one of the pixel structures of the liquid crystal display according to the first embodiment of the present invention.
[0023] Please refer to figure 1 as well as Figure 2A First, a transparent conductive layer 102 and a first metal layer 104 are sequentially formed on a substrate 100 . In a preferred embodiment, the substrate 100 includes, for example, a region where a thin film transistor T is to be formed, a region where a pixel electrode P is to be formed, a region where a storage capacitor C (storage capacitor) is to be formed, and pads B, B' to be formed (bonding pad) area. The substrate 100 is, for example, a transparent glass substrate or a transparent plastic substrate. The material of the transparent conductiv...
no. 2 example
[0036] Figure 3A to Figure 3B It is a schematic cross-sectional view of the manufacturing process of one of the pixel structures of the liquid crystal display according to the second embodiment of the present invention. Please refer to Figure 3A , Figure 3A Continuing from the previously stated Figure 2A to Figure 2F Schematic diagram of the subsequent process, that is, after the third photomask process is performed to define the second metal layer, a protective layer 200 is first formed on the substrate 100, and then a black material layer is formed on the protective layer 200 202. In a preferred embodiment, the material of the protective layer 200 is, for example, silicon oxide, silicon nitride, silicon oxynitride or organic material. The material of the black material layer 202 can be not only the black organic material or the black inorganic insulating material mentioned above, but also a metal material with light-shielding effect.
[0037] Afterwards, a fourth ph...
no. 3 example
[0042] Figure 5A to Figure 5B It is a schematic cross-sectional view of the manufacturing process of one of the pixel structures of the liquid crystal display according to the third embodiment of the present invention. Please refer to Figure 5A , Figure 5A Continuing from the previously stated Figure 2A to Figure 2F Schematic diagram of the subsequent process, that is, after the third photomask process is performed to define the second metal layer, a protection layer 200, a black material layer 202 and another protection layer are sequentially formed on the substrate 100 204. In a preferred embodiment, the material of the protection layer 200 and the protection layer 204 is, for example, silicon oxide, silicon nitride, silicon oxynitride or an organic material. The material of the black material layer 202 can be a black organic material, a black inorganic insulating material or a metal material with a light-shielding effect.
[0043] Afterwards, a fourth photomask pro...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More