Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Atmospheric pressure discharge cold plasma generator based on double gas source

A cold plasma and generator technology, applied in the direction of plasma, electrical components, etc., can solve the problems of reducing the service life of cold plasma generators, increasing the cost of using cold plasma technology, etc., so as to reduce operating costs and achieve rapid processing capabilities. Effect

Inactive Publication Date: 2008-07-23
TSINGHUA UNIV
View PDF9 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, in the existing atmospheric pressure cooled plasma generators, whether it is a flat-plate cold plasma generator or a coaxial type cold plasma generator, the working gas of the cold plasma is industrial gas such as pure helium or pure argon, or the electrode surface A dielectric layer is attached, which greatly increases the cost of using the cold plasma technology and reduces the service life of the cold plasma generator

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atmospheric pressure discharge cold plasma generator based on double gas source
  • Atmospheric pressure discharge cold plasma generator based on double gas source
  • Atmospheric pressure discharge cold plasma generator based on double gas source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] The application adopts such as figure 1 Dual gas source gas supply system shown. By making the gas that can discharge stably under atmospheric pressure (such as helium, argon, etc.) discharge first, and then increase the flow of gas that cannot discharge stably under atmospheric pressure (such as air, nitrogen, etc.), induce its discharge, and at the same time gradually close the inducing gas ( gas that can be stably discharged under atmospheric pressure), and finally realize the discharge of gas that cannot be stably discharged under atmospheric pressure such as air and nitrogen, thereby expanding the types of working gases for atmospheric pressure discharge cold plasma, and greatly reducing the use cost of this technology.

[0041] figure 1 Schematic diagram of the dual gas source gas supply system. Among them, 101 is an inducing gas source (a gas source that can discharge stably under atmospheric pressure, such as a helium gas bottle, an argon gas bottle, etc.), an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention belongs to atmospheric pressure discharge cold plasma generator technology field. It features said generator gas supply system adopting double gas source gas supply system and uncover electrode structure, thereby constituting flat plate type or circle type or elliptic type atmospheric pressure discharge cold plasma generator. Said double gas source gas supply system can realize stabilizing gaseous discharge unable realized in inducing air or other atmospheric pressure, uncover electrode structure capable of avoiding electrode surface dielectric medium damage in current media blocking discharge.

Description

technical field [0001] The invention belongs to the technical field of atmospheric pressure cooling plasma generators. Background technique [0002] At present, a large area of ​​non-equilibrium cold plasma can be generated under low pressure conditions, but the existence of the vacuum chamber, on the one hand, greatly increases the manufacturing and maintenance costs of the equipment, on the other hand, it also limits the geometric size of the workpiece to be processed, thus This greatly limits its scope of application. At present, there are two types of plasma that can be generated under atmospheric pressure conditions. One is thermal plasma, which is characterized by high gas temperature, about 10,000K, and is mainly used for plasma spraying, cutting, welding, waste treatment, materials, etc. Surface processing and other fields. Due to the high temperature of hot plasma, it cannot be used for processing materials that are afraid of heat; the other is cold plasma, which ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/46H05H1/30
Inventor 李和平高星包成玉张小章王华博孙文廷
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products