Method for producing film tranistor array and its driving circuit
A technology of thin-film transistors and driving circuits, which is applied in the field of manufacturing thin-film transistor arrays and their driving circuits, and can solve problems such as difficulty in reducing manufacturing process costs, difficulty in improving yield rates, and inability to effectively shorten panel time.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0039] 3(A) to 3(I) are cross-sectional views of the manufacturing process of the thin film transistor array and the driving circuit according to a preferred embodiment of the present invention. Please refer to FIG. 3(A), first provide a substrate 300, and sequentially form a polysilicon layer and an N+ doped thin film on the substrate 300, and then a first photomask process (Mask 1) defines the above-mentioned polysilicon layer and N+ doped thin films to form a plurality of island structures formed by stacking polysilicon layers 302a, 302b, 302c and N+ doped thin films 304a, 304b, 304c.
[0040] The above-mentioned polysilicon layer is formed by, for example, first forming an amorphous silicon film (a-Si) on the substrate 300, and then performing an excimer laser annealing (Excimer Laser Annealing, ELA) process on the amorphous silicon layer, so that the amorphous The crystalline silicon layer is crystallized into a polysilicon layer. The formation method of N+ doped film is...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 