Nonvolatile storage unit in high speed
A non-volatile, high-speed storage technology, applied in the field of memory, can solve the problems of slow random writing and long writing cycle, and achieve the effect of improving reliability and low cost
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[0031] The present invention proposes a non-volatile high-speed storage unit and a non-volatile high-speed memory using the storage unit. Each storage unit uses two common field effect transistors and one floating gate field effect transistor. It has the characteristics of fast and random access similar to DRAM, and can save data for a long time after power failure.
[0032] Figure 4 It is a structural schematic diagram of the non-volatile high-speed memory unit of the present invention. Such as Figure 4As shown, the memory cell includes a first field effect transistor Q1, a second field effect transistor Q2 and a third floating gate field effect transistor Q3. The gate of the first field effect transistor Q1 is connected to the row selection line 20, one of the source and the drain of the first field effect transistor Q1 is connected to the column selection line 10, and the other is connected to the second field effect transistor Q2. The gate is connected to one of the s...
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