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Method for manufacturing thin film transistor

A technology of thin-film transistors and manufacturing methods, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of low yield rate of finished products, complicated manufacturing process, high equipment cost, etc., reduce equipment cost, improve product yield, The effect of manufacturing process simplification

Inactive Publication Date: 2009-09-23
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to overcome the disadvantages of cumbersome manufacturing process, high equipment cost and low yield of finished products in the prior art, the present invention provides a thin film transistor manufacturing method that can effectively simplify the manufacturing process of thin film transistors, save process equipment costs, and improve production yield

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  • Method for manufacturing thin film transistor
  • Method for manufacturing thin film transistor
  • Method for manufacturing thin film transistor

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Embodiment Construction

[0011] see figure 2 , is a flow chart of the manufacturing process of the thin film transistor of the present invention. The manufacturing method of the thin film transistor disclosed in the present invention is to firstly provide a substrate; clean the substrate; use laser CVD to coat the substrate to form the required circuit.

[0012] The substrate is a bare board, and the cleaning step is to use substrate cleaning equipment to clean with cleaning liquid.

[0013] The circuit deposition step is completed by using laser CVD repair method and computer program control, so it can meet the circuit deposition of large-area substrates. The principle of the laser CVD repair technology is to use the characteristics of high laser energy density and rapid temperature rise when interacting with materials to induce the gas source reaction containing pre-film elements, and then decompose the pre-film elements and deposit them on the substrate. Therefore, the laser is directly projecte...

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Abstract

The invention provides a thin film transistor manufacturing method that can effectively simplify the manufacturing process of the thin film transistor, save the cost of process equipment, and improve the production yield, which includes the following steps: providing a substrate, cleaning the substrate, and using laser chemical vapor deposition The repair technique deposits a film on a substrate for circuit deposition.

Description

【Technical field】 [0001] The invention relates to a manufacturing method of a thin film transistor. 【Background technique】 [0002] TFT (Thin Film Transister, thin film transistor) is the basic component of liquid crystal display. The existing thin film transistor technology is to form various films necessary for circuits by sputtering and chemical deposition methods on non-single chips or single chips such as glass or plastic substrates, and to manufacture integrated circuits by processing the films. Thin film transistors are generally made of amorphous silicon or polysilicon. Taking the amorphous silicon manufacturing process as an example, it generally includes three steps: active layer manufacturing, gate manufacturing, and source / drain manufacturing. The order can be changed according to different structures. And each process includes deposition (Deposit), development (Develop) and etching (Etch). [0003] Such as figure 1 As shown, it is a flow chart of making a cir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/336H01L21/02G02F1/136
Inventor 曾江弘彭家鹏林至成吴泽
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD