CVD diamond film continuous preparation system

A preparation system and diamond film technology, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of large filament loss, long auxiliary time, high preparation cost, etc., to achieve industrialized production and reduce manufacturing costs. The effect of small cost and volume

Inactive Publication Date: 2007-08-01
海安常科技术转移中心有限公司
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  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to solve the problems of low efficiency, large filament loss, long auxiliary time and high production cost caused by the inability of the existing diamond film preparation device to continuously prepare CVD diamond film, and to invent a continuous preparation method for CVD diamond film. system, it can not only ensure that the carbonized filament will not break, it can be used continuously, greatly reducing the filament consumption, and can also reduce the auxiliary time of reinstalling the filament, vacuuming, carbonizing the filament, and filling the vacuum chamber, etc., and realizes continuous CVD diamond film preparation, greatly improving the preparation efficiency of the diamond film and reducing the manufacturing cost of the diamond film

Method used

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example 1

[0046] After adopting the present invention, in H 2 -CH 4 Prepare a batch of CVD diamond-coated tools under the system, the batch size is 500 pieces, a square substrate table with a diameter of 80×80 is used, the heating wire is a tantalum wire of φ0.3, and the substrate table can be placed with a size of 12.7 25 blades of ×12.7×4.76, auxiliary time for filament installation, filament carbonization, vacuuming, etc. is about 9 hours, it takes 15 minutes to vacuumize the loading and unloading chamber and place the substrate each time, and the deposition time is about 5 hours each time, 500 pieces of tools The deposition time of the CVD diamond coating is about 114 hours. And do not adopt the present invention to prepare diamond-coated cutter, filament installs once and can deposit 25 cutters, and the cost of tantalum wire is about 1500 yuan when depositing 500 cutters, and the time of filament installation, filament carbonization, vacuumizing, vacuum chamber venting etc. is abo...

example 2

[0048] After adopting the present invention, in H 2 -CH 4 Prepare a batch of CVD diamond-coated wire-drawn films under the system, the batch size is 800, a circular substrate table with a diameter of φ80 is used, and a tantalum wire with a diameter of φ0.3 is used for the hot wire. The substrate table can be placed with a size of φ5 at a time. 100 drawing film blanks of ×3, about 9 hours for filament installation, filament carbonization, vacuuming, etc., 20 minutes for vacuuming the loading and unloading cavity and placing the substrate each time, about 6 hours for each deposition, 800 pieces of drawing film The deposition time of the CVD diamond coating is about 48 hours. Without adopting the present invention to prepare diamond-coated cutters, 100 wire-drawn films can be deposited once the filament is installed. When depositing 800 wire-drawn films, the cost of tantalum wire is about 600 yuan. Filament installation, filament carbonization, vacuuming, vacuum chamber degassin...

example 3

[0050] After adopting the present invention, in H 2 -CH 4 The mechanism research experiment of nano-diamond film was carried out under the Ar system. Three factors were considered, each factor was taken at three levels, and five test pieces were used for each pilot point. In order to ensure the accuracy of the test, each pilot point uses 3 repeated tests, the total number of tests is 27, and the total number of test pieces needs to be 135. The test uses a substrate table with a diameter of φ30mm, and 5 specimens are placed on the substrate table for each test, and the heating wire uses a φ0.3 tantalum wire. Compared with not using the present invention, it can reduce the installation of hot wire by 26 times, save the cost of filament by about 1000 yuan, reduce the auxiliary time by about 250 hours, and save about 2500 yuan in deposition costs such as water, electricity and gas.

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Abstract

The invention discloses a CVD diamond membrane continuous preparing system, comprising settling deceive, transition device and loading device. It realizes continuous preparation by changing substrate on condition of constant working condition in settling cavity. It guarantees no breakage for carbonized filament, greatly reduces filament consumption, dramatically increases preparing efficiency for diamond membrane and reduces production cost.

Description

technical field [0001] The invention relates to a CVD diamond film preparation equipment, in particular to a CVD diamond film preparation equipment capable of continuous batch preparation, in particular to a CVD diamond film continuous preparation system. Background technique [0002] At present, the properties of chemical vapor deposition (referred to as CVD) diamond films have reached or approached those of natural diamonds, and have broad application prospects in today's industrial fields. The hot wire CVD (HFCVD for short) method is one of the important methods for preparing CVD diamond film at present. It uses the energy provided by the heating filament to decompose the reaction gas, and the active substances produced by the decomposition of the reaction gas generate diamond on the substrate surface. When depositing diamond film by HFCVD method, firstly, the substrate material for depositing CVD diamond film needs to be placed in the deposition chamber, and the air in t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/54C23C16/27
Inventor 卢文壮左敦稳徐锋钟磊王珉黎向锋林欢庆陈兴峰戴军之宋海薇张敏
Owner 海安常科技术转移中心有限公司
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