Composite preparation method of vacuum sputtering coating and chemical coating for electromagnetic wave screen fabric and production thereof

A technology of vacuum sputtering and chemical coating, which is applied in the direction of sputtering coating, liquid chemical coating, vacuum evaporation coating, etc. It can solve the problems that electromagnetic wave shielding fabrics cannot be flexible, environmentally friendly, economical, and high-efficiency, and achieve fabric softness Effect

Inactive Publication Date: 2007-09-12
SHANGHAI WEAVING SCIENCE RESEARCH INSTITUTE CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The above-mentioned types of electromagnetic wave shielding fabrics cannot be flexible, environmentally friendly, economical, and high-efficiency, and there is no way to obtain the electromagnetic wave shielding effectiveness of flexible fabrics above 90dB in a wide frequency range.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Preparation of Electromagnetic Wave Shielding Polyester Woven Fabric by Combination Technology of Vacuum Sputtering Copper Plating and Electroless Copper Plating

[0035] (1) Process flow

[0036] Polyester woven fabric→low temperature plasma treatment→sputter copper plating→electroless copper plating→washing→apply protective layer→drying→electromagnetic wave shielding polyester fabric

[0037] (2) Process conditions

[0038] ①The base material of 210T polyester woven fabric is subjected to alkali reduction treatment according to the conventional process in advance.

[0039] ②Low temperature plasma treatment process

[0040] Fabric running speed: 1m / min;

[0041] Gas temperature: 300K;

[0042] Air pressure: normal pressure.

[0043] ③Vacuum sputtering copper plating process

[0044] Excitation gas: argon;

[0045] Sputtering copper plating time: 10min;

[0046] Working vacuum: 1.2×10 -2 Pa.

[0047] ④ Electroless copper plating process

[0048] Plating solut...

Embodiment 2

[0064] Electromagnetic wave shielding polyester spunbonded nonwovens were prepared by vacuum sputtering copper plating and electroless copper plating.

[0065] (1) Process flow

[0066] Nonwovens → low temperature plasma treatment → sputtering copper plating → electroless copper plating → washing → applying a protective layer → drying → electromagnetic wave shielding nonwovens.

[0067] (2) Process conditions

[0068] ①The base fabric is 60g / m 2 Polyester nonwoven fabric.

[0069] ②Low temperature plasma treatment:

[0070] Fabric running speed: 1.5m / min;

[0071] Gas temperature: 300K;

[0072] Air pressure: normal pressure.

[0073] ③Vacuum sputtering copper plating process

[0074] Excitation gas: argon;

[0075] Sputtering coating time: 10min;

[0076] Working vacuum: 1.2×10 -2 Pa.

[0077] ④ Electroless copper plating process

[0078] Plating solution formula:

[0079] Copper sulfate 28g / L,

[0080] Methanol 15mL / L,

[0081] Sodium Potassium Tartrate 80g / L,...

Embodiment 3

[0094] Electroless copper plating and vacuum sputtering silver plating composite technology to prepare electromagnetic wave shielding polyester woven fabric.

[0095] (1) Process flow

[0096] Alkali-reduced polyester woven fabric→catalysis→water washing→activation→water washing→electroless copper plating→water washing→drying→low temperature plasma treatment→vacuum sputtering silver plating→apply protective layer.

[0097] (2) Process conditions

[0098] ① The base fabric is 260T alkali-reducing polyester woven fabric.

[0099] ② Catalysis

[0100] Catalytic solution formula:

[0101] Stannous chloride (SnCl 2 ) 20g / L,

[0102] Hydrochloric acid (HCl) 40mL / L;

[0103] Catalytic working temperature: 25°C;

[0104] Catalytic time: 10min.

[0105] ③Activation

[0106] Activation Solution Formula:

[0107] Palladium Chloride (PdCl 2 ) 0.5g / L,

[0108] Hydrochloric acid (HCl) 5mL / L;

[0109] Activation working temperature: 25°C;

[0110] Activation time: 5min.

[011...

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PUM

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Abstract

This invention relates to a complex manufacturing method and its product for vacuum sputter and chemical film-platings on industrial and household electromagnetic wave screen fabrics including one of the two methods: a, a fabric backing->plating a metal film by vacuum sputter->plating a metal film chemically->washing->exerting a protection layer->drying, b, factric backing->catalyzing->washing->activating->washing->plating metal film chemically->washing->drying->plating a metal film by vacuum sputter->enforcing a protection layer, in which, the fabrics can be processed with low temperature plasma before vacuum sputtering metal film characterizing in including a layer of tatted cloth or non-woven cloth , a layer of metal film deposited by a sputter film-plating method, an another metal film and a protection layer.

Description

technical field [0001] The invention relates to a method for manufacturing electromagnetic wave shielding fabrics by vacuum sputtering and electroless plating on textile materials in textile industry production and a high-efficiency electromagnetic wave shielding fabric prepared by this method. The products can be widely used in military industry, scientific research, industry and agriculture Medical and other industrial fields, as well as the shielding and protection of harmful electromagnetic waves of household appliances in ordinary people's homes. Background technique [0002] The textile materials used for electromagnetic wave shielding include metal wire fabric, metal wire and textile yarn interwoven or embedded fabric, metal fiber or carbon fiber and conventional textile fiber blended yarn fabric, electroplated metal film fabric, chemically plated metal film fabric, vacuum plating Metal film fabric, etc. Among the above-mentioned numerous electromagnetic wave shieldi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/00C23C14/35C23C14/14C23C18/40
Inventor 周菊先吴永刚
Owner SHANGHAI WEAVING SCIENCE RESEARCH INSTITUTE CO LTD
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