Hanger bearing image-forming system and light scribing device

An imaging system and suspension technology, applied in the field of projection exposure, can solve the problems of increasing the overall mass and increasing the difficulty of design, and achieve the effects of reducing stiffness requirements, improving relative vibration modes, and strong anti-interference.

Inactive Publication Date: 2007-09-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] When using rigid support connections, it is generally used to increase the stiffness of the entire imaging system including the support system to

Method used

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  • Hanger bearing image-forming system and light scribing device
  • Hanger bearing image-forming system and light scribing device
  • Hanger bearing image-forming system and light scribing device

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Embodiment Construction

[0017] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0018] As shown in Figures 1, 2, and 3, the suspended support imaging system of the present invention includes an imaging system 105 and a supporting device, and also includes a state detection sensor 103 and an active execution device 113, and the state detection sensor 103 is fixedly arranged on the imaging system 105 Above; the active execution device 113 is arranged between the support frame 112 and the base frame 101 of the imaging system 105, which is connected to the state detection sensor 103 for receiving the signal obtained by the position state sensor and controlling and correcting the position of the imaging system 105; The supporting device is a suspension member 111, the imaging system 105 is suspended at the lower end of the suspension member 111, and the imaging system 105 is connected with the lower end of the suspension member ...

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Abstract

This invention discloses one hanging supportive imaging system and the light etch device with the system in the projection exposure technique field, which comprises imaging system and supportive device and is characterized by the following: it also comprises status test sensor and one active execution device, wherein, the status sensor is set on the imaging system and the active execution device is set outside imaging system connected to the sensor to receive the signals from the sensor and to correct the imaging system position; the supportive device is of hanging part down the hanging parts.

Description

technical field [0001] The invention belongs to the technical field of projection exposure, and in particular relates to a suspended support imaging system for a projection exposure device and a photolithography device with the imaging system. Background technique [0002] Lithography devices generally have two methods of stepping or scanning. Stepping lithography is to move the silicon wafer / wafer step by step on the workpiece table, and the mask pattern will be gradually projected on the area of ​​the silicon wafer that needs to be exposed through the projection objective lens; scanning Exposure is that the workpiece table carries the silicon wafer and the mask table carries the reticle according to the ratio of the exposure system, and performs synchronous reverse uniform motion for exposure. Especially for the latter, the quality of exposure depends on the stability of the opto-mechanical system. Therefore, each All aspects of system design will have a non-negligible imp...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/027
Inventor 严天宏朱岳彬袁志扬王天明邹恒杉唐海明刘育
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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