Non-destructive measurement method of nanometer cantilever thickness based on force curve of atomic force microscope

Abstract

The non-destructive measurement method of nanometer cantilever thickness based on force curve of atomic force microscope includes the first scanning measurement to obtain the 3D topographic information of the nanometer cantilever area and the distance between the upper surface and the base of the nanometer cantilever; the subsequent reducing the scanning range to locate the probe of the atomic force microscope precisely and to load and unload vertically with the probe until the lower surface of the nanometer cantilever contacts with the base and the force curve exhibits turnover, and recording the real-time force curve of the atomic force microscope during loading and unloading to obtain the distance between the lower surface and the substrate of the nanometer cantilever; and finally subtracting the data obtained in the foregoing steps to calculate the nanometer cantilever thickness. The said method may be also used in measuring other dimensions of nanometer structure.

Description

technical field [0001] The invention relates to a measurement method for a micro / nano electromechanical system. In particular, it relates to a non-destructive precision measurement of the thickness of nanostructures with suspension gaps such as nanobeams, which can also be directly applied to the highly precise measurement of suspension gaps of such nanostructures. Destroy the measurement method. Background technique [0002] Nanoelectromechanical systems (NEMS) is an emerging technology field developed on the basis of microelectromechanical systems (MEMS), and it is also an important part of nanotechnology. Nanobeams are the most basic and representative nanostructures in NEMS, and are the basis of many nanofunctional devices, such as resonators, biosensors, and radio frequency devices. The size of the nanobeam structure is at the nanometer scale, and the measurement methods for various important characteristics are still in the research stage, and the premise of these im...

AI Technical Summary

Problems solved by technology

In the field of nanotechnology, scanning electron microscopy is now widely used to measure the thickness of nanobeams. This method is to obtain the thickness value based on the scanning electron microscope image of the beam section, which often needs to destroy the sample structure. Generally, a batch of After having structures of the same size, some of them are used for this destructive thickness measurement, but the same process flow does not guarantee that all structures processed have exactly the same size characteristics, so this method often cannot obtain the target structure to be measured the true thickness of

[0003] In the case that the thickness of the nanostructure has little influence on the measurement result, the above method can be used for approximate thickness measurement, but in the case that the thickness of the nanostructure has a great influence on the measurement result, it must be precisely measured

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