Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Quasimolecule light irradiator

An excimer and light irradiation technology, applied in the field of excimer light irradiators, can solve problems such as reducing the operation rate of production plants, and achieve the effects of improving the operation rate, ensuring light irradiation, and ensuring lifespan

Inactive Publication Date: 2008-05-28
USHIO DENKI KK
View PDF1 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] Substrate processing equipment must be stopped when lamps are replaced, and the shutdown of substrate processing equipment due to replacement of lamps that do not reach the end of their life at regular intervals is one of the causes of lowering the overall operating rate of the production plant and is a major problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Quasimolecule light irradiator
  • Quasimolecule light irradiator
  • Quasimolecule light irradiator

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033]First Embodiment An example in which the present invention is applied to a liquid crystal substrate cleaning device is shown in FIG. 1 as a substrate processing device equipped with an excimer light irradiator. Fig. 1 will be described. 1 shows a view in which the light-irradiated surface of the substrate 13 to be processed faces upward on the paper, and a schematic cross-sectional view (lower view) in a direction perpendicular to the tube axis direction of the excimer lamp 2 . 1 is the main body of the excimer light irradiator. The excimer light irradiator main body 1 consists of an excimer lamp 2, a spare lamp 3, a light box 4 in which the lamp is installed, and an electrical installation part (electrical installation part) for controlling the lighting of the lamp. 5. And a display 6 for displaying each lighting condition, lighting state, and abnormal state. Further, the substrate transfer device 7 is composed of a transfer roller ring 8 for transferring the substrate...

Embodiment 2

[0036] FIG. 2 shows this excimer photoirradiator provided with a plurality of backup lamps as another embodiment of the present invention. 2-a) is a cross-sectional view of a plane perpendicular to the lamp tube axis, in which a square excimer lamp 22 and a spare lamp 23 of the same square shape are arranged side by side in a light box 21 . 2-a) is a schematic layout view of the excimer light irradiator viewed from above and a cross-sectional view of a plane perpendicular to the tube axis of the excimer lamp 22 . In this embodiment, the excimer lamps 22 are arranged so as to partially overlap in the width direction of the substrate to be processed, and two excimer lamps 22 irradiate the entire width direction. Three groups of excimer lamps 22 are arranged side by side, and a predetermined light output is ensured as excimer lamps 22 for general use arranged to satisfy a predetermined processing capacity. In addition, two sets of backup lamps 23 set in the same manner in the wi...

Embodiment 3

[0039] Fig. 3 is a timing chart showing the lighting timing of the excimer lamp and the backup lamp of the present invention. Fig. 3-a) is the excimer light irradiator when four excimer lamps 26 are arranged side by side in the light box 25 as common excimer lamps, and one spare lamp 27 is arranged on the downstream side of the conveying direction of the substrate to be processed 25 sketches. In addition, FIG. 3-b) is a timing chart of lighting timing corresponding to the layout shown in a). In Fig. 3-b), in the configuration diagram shown in a), the left side of this excimer lamp 26 is set as upstream, and each excimer lamp 26 is set as the first lamp, the second lamp, the third lamp from the left end. lamp, the fourth lamp. The horizontal axis of Figure 3-b) is the time axis. When the lighting signals of the first lamp to the fourth lamp are input, the excimer lamps from the first lamp to the fourth lamp are turned on. Here, if the fourth lamp is not lit, it is detected ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a quasimolecule light irradiator which detects the life duration of the quasimolecule light arranged at the quasimolecule light irradiator, supplements the insufficient light output, thereby avoiding stopping the substrate treatment device virtually. The quasimolecule light irradiator is arranged at the substrate treatment device with a transmitting mechanism of the transmitting substrate irradiating the quasimolecule light and disposing the substrate. The invention is characterized in that the quasimolecule light irradiator is provided with a plurality of rod-shaped quasimolecule lamps corresponding to the transmitting direction of the substrate in right angle, with the supply power dependently adjusting the output of every quasimolecule lamp, with the detection function detecting the light output of every quasimolecule lamp, with the light output supplement function; when the light output from at least one quasimolecule lamp fails to reach the specified output, the light output corresponding to the insufficient light output is supplemented.

Description

technical field [0001] The invention relates to an excimer light irradiator, which is used for irradiating ultraviolet light on glass, semiconductor, resin, ceramics, metal, etc., such as liquid crystal panel substrates, semiconductor wafers, magnetic disk substrates, optical disk substrates, etc., and the surfaces of these synthesized substrates, Substrate processing for cleaning, etching, etc. Background technique [0002] In the manufacturing process of semiconductors and liquid crystal substrates, etc., ultraviolet light is widely used for substrate processing such as cleaning. As such a technique, for example, Japanese Patent Laid-Open No. 2003-275576 ​​and the like are known. In this publication, it is described that a substrate processing apparatus equipped with an excimer light irradiator irradiates ultraviolet light in the range of 200 nm or less and 100 nm or more radiated from the excimer light irradiator on the substrate to be processed in an oxygen-existing atm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F21V21/34H05B41/36G21K5/10
CPCB08B7/0057H01J65/04H01L21/67011
Inventor 菱沼宣是中村雅规
Owner USHIO DENKI KK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products