Semiconductor laser device having incomplete bonding region and electronic equipment
A laser device and semiconductor technology, which is applied to the structure of semiconductor lasers, semiconductor devices, and optical waveguide semiconductors, can solve problems such as insufficient reliability improvement, achieve high reliability, improve reliability, and suppress deformation.
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no. 1 approach
[0042] FIG. 1A shows a cross section of a semiconductor laser element 100 included in the first embodiment of the semiconductor laser device of the present invention. In this first embodiment, the semiconductor laser element 100 has a ridge structure. Semiconductor laser element 100 includes: n-GaAs substrate 101, n-GaInP buffer layer 102, n-AlGaInP cladding layer 103, quantum well active layer 104, p-AlGaInP first cladding layer 105, etch stop layer 106, p-AlGaInP The second cladding layer 107 , the p-GaAs contact layer 108 , the p-side contact electrode 109 , the dielectric film 110 , the plated metal layer 112 as a conductive electrode, and the n-electrode 113 .
[0043]In addition, this semiconductor laser element 100 has a light emitting region 150 extending in a stripe shape perpendicular to the paper surface in FIG. 1A . Furthermore, this semiconductor laser element 100 has a solder layer 114 laminated on the plated metal layer 112 .
[0044] The solder layer 114 does...
no. 2 approach
[0061] FIG. 2 shows a second embodiment of the semiconductor laser device of the present invention. This second embodiment differs from the first embodiment in that a semiconductor laser element 500 is provided instead of the semiconductor laser element 100 shown in FIG. 1C . Therefore, in this second embodiment, the same reference numerals are used for the same parts as those of the first embodiment, and differences from the first embodiment will be mainly described.
[0062] In the first embodiment, the second cladding 107 is left only in the region to be the ridge, but in the second embodiment, as shown in FIG. 2 , not only the second cladding 107 constituting the ridge , and further includes a second cladding layer TS separated from the second cladding layer 107 by a predetermined dimension (for example, 5 μm to 100 μm) on both sides in the X direction.
[0063] That is, in this second embodiment, at the time of manufacture, a region is etched from the end of the second c...
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