Plasma case for thin film production in enormous quantities

A plasma box and plasma technology, applied in plasma, gaseous chemical plating, metal material coating process, etc., can solve problems such as complex design, and achieve the effects of reducing equipment costs, low production and maintenance costs, and high costs
CN101245449AInactive Publication Date: 2008-08-20BEIJING XINGZHE MULTIMEDIA TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
BEIJING XINGZHE MULTIMEDIA TECH
Publication Date
2008-08-20
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a plasma enhanced chemical vapor deposition (PECVD) device and a method which are used for simultaneously coating films on a plurality of large-area base plates. A plurality of large-area base plates are arranged in rectangle plasma chambers comprising a plurality of parallel exciting electrodes and grounding electrodes at intervals and in staggered arrangement. A plurality of plasma regions are uniformly formed among all adjacent and opposite electrodes. The large-area electrode surfaces of all plasma chambers are used in a great quantity of the same, fixed and grouped film coatings of the PECVD system of a single vacuum chamber.
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Description

technical field

[0001] The invention discloses a vacuum coating device, in particular to a batch-processing PECVD device and method for producing low-cost and high-yield thin films on a large-area substrate. Background technique

[0002] The traditional plasma-enhanced chemical vapor deposition (PECVD) system is designed such that, in a glow discharge structure in which electrical energy is capacitively coupled into a pair of parallel electrodes, each excitation electrode (power electrode, also known as an energy supply electrode, Cathode or negative electrode) provide one, and usually only one corresponding coating surface. Figure 8 Shown is such a conventional parallel electrode glow discharge (PECVD) deposition apparatus. by Figure 8 For example: in the vacuum chamber 40 of the PECVD system, there are two planar electrodes with opposite polarities, which are respectively the excitation electrode 48 and the ground electrode 47, and these two parallel electrodes keep an a...

Claims

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