Window material for silicon based thin film solar battery and preparing method thereof
A silicon-based thin film, solar cell technology, applied in circuits, photovoltaic power generation, electrical components, etc., to achieve the effect of easy process transfer
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[0032] The present invention is aimed at microcrystalline silicon or nano-silicon-based thin-film solar cells where sunlight is incident from the N direction of the solar cell, and proposes key N-type window materials in the structure of silicon-based thin-film cells and its preparation method. The specific implementation methods are as follows:
[0033] Prepare silicon-based thin-film solar cells on substrates by using plasma-enhanced chemical vapor deposition (PECVD), hot-wire chemical vapor deposition (HW-CVD), very high-frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) and other deposition methods .
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[0035] based on figure 1 with figure 2 The preparation of P / I / N type on a flexible or rigid substrate and the preparation of N / I / P type thin film solar cells on a transparent flexible or rigid substrate as shown, taking the PECVD method as an example, introduces the deposition of N-type microcrystals Silicon oxide (μc-SiO:H) functional material is used as the window material of the silicon-based thin film solar cell of the present invention, and the specific preparation process is as follows:
[0036] 1. For figure 1 , will have the sample of substrate S, metal M, transparent conductive film T1, boron-doped silicon-based film P, intrinsic silicon-based film I; or for figure 2 , put the sample with substrate S and transparent conductive film T1 into the PECVD deposition system, the background vacuum is higher than 10 -4 support;
[0037] 2. Control the reaction deposition parameters to deposit microcrystalline silicon oxide film on the above samples;
[0038] In step 2, ...
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