Method for producing structure

A technology for components and supporting components, which can be used in photosensitive materials for opto-mechanical equipment, 3-dimensional image production, photoengraving of pattern surfaces, etc., and can solve problems such as difficult production.
CN101266404AInactive Publication Date: 2008-09-17FUJITSU LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
FUJITSU LTD
Publication Date
2008-09-17
Estimated Expiration
Not applicable · inactive patent

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Abstract

According to the present invention, a method is provided for manufacturing a structure composed of a photoreactive resin comprising the steps of: forming the photoreactive resin on a sheet member soluble in water; exposing the photoreactive resin selectively to a radiation activating the photoreactivity to produce the structure; and dissolving the sheet member in water after the exposing step.
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Description

technical field

[0001] The present invention relates to methods for fabricating structures made of photoreactive or photocurable resins. This photoreactive resin (photosensitive resin) is generally called a resist and is developed. The photocurable resin is used in stereolithography technology. What these resins have in common is that light is used to achieve at least a photoreaction. Unless otherwise specified, these resins are referred to as "photoreactive resins" in this specification. Background technique

[0002] Demand for microstructures such as bio-elements and optical devices composed of photoreactive resins is increasing today. The application of photolithography (exposure) in which a mask pattern is transferred to a resin and nanoimprint technology in which a mold pattern is transferred has been conceived for making microstructures. However, photolithography is a technique in which, after exposure, a pattern is transferred to a substrate under a photoreactive ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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