Method for producing structure

A technology for components and supporting components, which can be used in photosensitive materials for opto-mechanical equipment, 3-dimensional image production, photoengraving of pattern surfaces, etc., and can solve problems such as difficult production.

Inactive Publication Date: 2008-09-17
FUJITSU LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to simply fabricate structures made of photoreactive resins, such as microstructured devices with through-hole patterns

Method used

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  • Method for producing structure
  • Method for producing structure
  • Method for producing structure

Examples

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Embodiment Construction

[0029] A method for fabricating a structure according to an embodiment of the present invention will be described below with reference to the accompanying drawings. figure 1 Steps in the fabrication method are shown.

[0030] A hot water soluble sheet 10 is formed (step 1100). The hot water soluble sheet member 10 is a hot water soluble sheet member and is composed of agar or polyvinyl alcohol resin. These materials are also environmentally friendly. Agar is soluble in hot water at a temperature of about 50 degrees Celsius or higher. Polyvinyl alcohol resin is soluble in hot water at a temperature of about 80 degrees Celsius or higher. The size and shape of the hot water soluble sheet member 10 are not particularly limited.

[0031] The photoreactive resin 20 is coated on the hot water soluble sheet 10 (step 1200). Examples of photoreactive resins that can be used include, but are not limited to: polyvinylcinnamate, cyclized polyisoprene-bisazide, novolac resin, fluorocar...

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PUM

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Abstract

According to the present invention, a method is provided for manufacturing a structure composed of a photoreactive resin comprising the steps of: forming the photoreactive resin on a sheet member soluble in water; exposing the photoreactive resin selectively to a radiation activating the photoreactivity to produce the structure; and dissolving the sheet member in water after the exposing step.

Description

technical field [0001] The present invention relates to methods for fabricating structures made of photoreactive or photocurable resins. This photoreactive resin (photosensitive resin) is generally called a resist and is developed. The photocurable resin is used in stereolithography technology. What these resins have in common is that light is used to achieve at least a photoreaction. Unless otherwise specified, these resins are referred to as "photoreactive resins" in this specification. Background technique [0002] Demand for microstructures such as bio-elements and optical devices composed of photoreactive resins is increasing today. The application of photolithography (exposure) in which a mask pattern is transferred to a resin and nanoimprint technology in which a mold pattern is transferred has been conceived for making microstructures. However, photolithography is a technique in which, after exposure, a pattern is transferred to a substrate under a photoreactive ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G03F7/20G03F7/30
CPCG03F7/40G03F7/09G03F7/0037G03F7/11
Inventor 松下直久饭田进
Owner FUJITSU LTD
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