Position control method and device based on H type structure two-sided driving system

Abstract

The invention provides a locating method and a corresponding apparatus used for an H-shaped drive structure. An X direction linear motor is adopted to realize an X axis movement and a Y1Y2 double-linear motor is adopted to realize a Y axis movement; the cross-coupling of two motors, namely, Y1 and Y2, is adopted to realize the control of reducing relative position errors; the cross-coupling of X axis and Y axis is adopted to realize the control of reducing contour errors; the control to the cross-coupling of three linear motors is adopted to reduce synchronous position errors and contour errors so as to realize the requirement of adopting the double-drive to synchronously control the accurate locating.

Description

Technical field [0001] The invention relates to a lithography equipment in the field of semiconductor frontiers, and in particular to a positioning control method and device of a bilateral drive system in a lithography machine. Background technique [0002] The silicon wafer production process includes a series of extremely complex, expensive, and time-consuming photolithography processes, and the lithography accuracy and yield of the lithography machine directly determine the design and manufacturing of the lithography equipment. As the market's demand for lithography productivity increases, it is also required to improve and improve the exposure quality and accuracy of the system. In this context, the actuator is required to still have high positioning accuracy when moving at high inertia and high speed. [0003] At present, the main methods of bilateral synchronous drive are parallel control and master-slave control. Parallel control method is the independent control of bilate...

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