Position control method and device based on H type structure two-sided driving system

A technology of bilateral driving and positioning method, which is applied in the direction of photolithography process exposure device, microlithography exposure equipment, etc., can solve the problems of phase inconsistency, restricting the performance of control mode, and unable to feedback, so as to reduce position error and improve dynamic performance. Does not match the parameters and achieves the effect of precise positioning

Active Publication Date: 2009-01-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The parallel control method is the independent control of the bilateral motors, which do not interact with each other, and the disturbance on either side will not affect the other side. However, once a disturbance occurs on one side, due to the lack of mutual feedback, it belongs to open-loop control. At this time, the synchronization of the system will be difficult to guarantee
At this time, the Rz axis is generally used to correct this out-of-synchronization, but this method not only adds one more control axis, but also causes the position deviation phase of the two synchronous a

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Position control method and device based on H type structure two-sided driving system
  • Position control method and device based on H type structure two-sided driving system
  • Position control method and device based on H type structure two-sided driving system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0069] The present invention involves the bilateral synchronous control of two linear motors in the Y direction. In bilateral drive control, the outputs of the two servo systems are coupled together through the crossbeam and the X motor, and the two motors are driven to move according to the same given signal. There is no direct coupling relationship on the electrical parameters. In an ideal state, assuming that the various performances of the two linear motors are exactly the same, and the loads acting on them are completely symmetrical, then when the same command is input, the two motors should move with the same acceleration, speed, and displacement. However, in actual situations, the performance of any two motors will not be completely the same, and the dynamic changes of the two loads caused by the movement of the X-direction linear motor on the beam cause the speed of the motors to change, which causes The position is not synchronized. In order to make the servo system retur...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a locating method and a corresponding apparatus used for an H-shaped drive structure. An X direction linear motor is adopted to realize an X axis movement and a Y1Y2 double-linear motor is adopted to realize a Y axis movement; the cross-coupling of two motors, namely, Y1 and Y2, is adopted to realize the control of reducing relative position errors; the cross-coupling of X axis and Y axis is adopted to realize the control of reducing contour errors; the control to the cross-coupling of three linear motors is adopted to reduce synchronous position errors and contour errors so as to realize the requirement of adopting the double-drive to synchronously control the accurate locating.

Description

Technical field [0001] The invention relates to a lithography equipment in the field of semiconductor frontiers, and in particular to a positioning control method and device of a bilateral drive system in a lithography machine. Background technique [0002] The silicon wafer production process includes a series of extremely complex, expensive, and time-consuming photolithography processes, and the lithography accuracy and yield of the lithography machine directly determine the design and manufacturing of the lithography equipment. As the market's demand for lithography productivity increases, it is also required to improve and improve the exposure quality and accuracy of the system. In this context, the actuator is required to still have high positioning accuracy when moving at high inertia and high speed. [0003] At present, the main methods of bilateral synchronous drive are parallel control and master-slave control. Parallel control method is the independent control of bilate...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/20
Inventor 赵娟吴立伟陈锐
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap