Position control method and device based on H type structure two-sided driving system
A technology of bilateral driving and positioning method, which is applied in the direction of photolithography process exposure device, microlithography exposure equipment, etc., can solve the problems of phase inconsistency, restricting the performance of control mode, and unable to feedback, so as to reduce position error and improve dynamic performance. Does not match the parameters and achieves the effect of precise positioning
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[0069] The present invention involves the bilateral synchronous control of two linear motors in the Y direction. In bilateral drive control, the outputs of the two servo systems are coupled together through the crossbeam and the X motor, and the two motors are driven to move according to the same given signal. There is no direct coupling relationship on the electrical parameters. In an ideal state, assuming that the various performances of the two linear motors are exactly the same, and the loads acting on them are completely symmetrical, then when the same command is input, the two motors should move with the same acceleration, speed, and displacement. However, in actual situations, the performance of any two motors will not be completely the same, and the dynamic changes of the two loads caused by the movement of the X-direction linear motor on the beam cause the speed of the motors to change, which causes The position is not synchronized. In order to make the servo system retur...
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