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Low thermal effect projection objective

A technology of projection objective lens and thermal effect, which is applied in the field of optical systems to achieve good uniform image quality and reduce difficulty

Active Publication Date: 2011-06-15
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
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Problems solved by technology

[0003] But how to prevent the thermal effect of the lens from the perspective of design and material selection, there are few related reports

Method used

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Embodiment Construction

[0015] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0016] see figure 1 , the projection objective lens of this embodiment adopts a symmetrical structure, and the front and rear halves of the system are symmetrical about the aperture AS, and there are 12 lenses L1-L12 in total. The half system contains 6 lenses, the first, second and sixth lenses L1, L2 and L6 have negative power, and the third, fourth and fifth lenses L3, L4 and L5 have positive power. Moreover, in the 400nm-420nm band, all materials with high transmittance and low thermal effect are selected, considering the practical requirements of lithography objective lenses under high exposure dose.

[0017] Ultraviolet submicron lithography objective lenses have extremely strict requirements on ultraviolet optical materials, especially under high exposure doses. If the lens material is not properly selected, the lens will heat...

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Abstract

The invention discloses a low heat effect projection objective which selects suitable material and reasonable structural design to realize small heat effect under high exposal dosage and reduce the difficulty of the heat effect compensation; simultaneously, good and uniform image quality can be realized in the square visible field with the specification of 44mm*44mm; the working distance between the object part and the image part is 30mm and the total length is not more than 800mm; furthermore, the non-spherical lens is not included and difficulty is not added for the processing, testing, installing and debugging.

Description

technical field [0001] The invention relates to an optical system, in particular to a total refraction projection optical system. Background technique [0002] At present, in the field of semiconductor packaging, there is an increasing demand for projection optical systems with micron-level resolution and high productivity. However, from the ultraviolet to the deep ultraviolet bands, the problem of lens heating has been encountered, and correspondingly many discussions have been made on how to compensate for the thermal effect. Detect or compensate for lens thermal effects. [0003] However, there are few related reports on how to prevent the thermal effect of lenses from the perspective of design and material selection. US Patent No. 7,239,450 discusses the use of two materials, quartz crystal (SILICA) and fluorite (CAF2), from the perspective of thermal effects. The main contribution of the patent is: summing up that thick lenses with small clear apertures are more affe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/00G02B1/00G03F7/20G02B27/00
Inventor 武珩储兆祥赵滨
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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