Exposure method, exposure apparatus, photomask and photomask manufacturing method
An exposure method and technology of an exposure device, which are applied in the field of photomasks, can solve the problems of difficulty in obtaining the exposure contribution rate of the scanning area, increase in size, etc., and achieve the effects of preventing enlargement and improving utilization efficiency.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0084]Hereinafter, an exposure apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing a schematic configuration of an exposure apparatus according to this embodiment. In this embodiment, an exposure apparatus of a step-and-scan method will be described as an example. In this exposure apparatus, a mask (first object, photomask) M and a flat plate (second object, photosensitive object) P Relatively moves the projection optical system PL composed of a plurality of catadioptric projection optical units PL1, PL3, PL5 and two not-shown projection optical units (hereinafter referred to as projection optical units PL2, PL4). On the flat plate P, the image of the pattern (original image pattern) formed on the mask M is transferred.
[0085] In addition, in the following description, the XYZ rectangular coordinate system shown in each drawing is set, and the positional relationship of each mem...
PUM
Property | Measurement | Unit |
---|---|---|
width | aaaaa | aaaaa |
width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com