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On-line checking method of quality and flow controller

A technology of mass flow and calibration method, applied in the field of microelectronics, can solve the problems of reduced use efficiency and long time consumption of plasma processing equipment, and achieve the effect of shortening detection time and improving use efficiency

Active Publication Date: 2009-05-20
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] As the volume of the reaction chamber continues to increase in recent years, the above-mentioned verification method takes longer and longer, and the efficiency of plasma processing equipment will therefore continue to decrease.

Method used

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  • On-line checking method of quality and flow controller
  • On-line checking method of quality and flow controller
  • On-line checking method of quality and flow controller

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0036] The core of the present invention is to provide an on-line verification method of a mass flow controller, which consumes less time in the verification process.

[0037] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0038] Please refer to figure 2 , figure 2 It is a flow chart of the online verification method of the mass flow controller provided by the first specific embodiment of the present invention.

[0039] In the first specific implementation mode, the online calibration method of the mass flow controller provided by the present invention includes the following steps:

[0040] Step S11:

[0041] Vacuumize the reaction chamber 12 through a vacuum pump group 19 or other vacuum obtaining devices, and keep the pumping speed constant; at the same time, fix the position of t...

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Abstract

The invention discloses an online check method for a mass flow controller, wherein the opening of a pressure control valve or the atmospheric pressure in a reaction chamber corresponds to the flow rate of gas one by one during the checking process, so that the gas with predetermined flow rate can be inputted and the opening of the pressure control valve or the atmospheric pressure in the reaction chamber is measured after the pressure is dynamically stabilized; the gas with the predetermined flow rate is inputted through the mass flow controller to be checked and the opening of the pressure control valve or the atmospheric pressure in the reaction chamber is measured after the pressure is dynamically stabilized again; and the conclusion that whether the mass flow controller to be checked is subjected to zero drift or not can be drawn by comparing the opening or the atmospheric in the two times. The time consumed by the check method is only the time for establishing dynamic pressure equilibrium in the reaction chamber, so that the check method can obviously shorten the breakdown detection time and quickly obtain the detection result, and is favorable for improving the service efficiency of plasma processing equipment.

Description

technical field [0001] The invention relates to the technical field of microelectronics, in particular to an online calibration method for mass flow controllers of plasma processing equipment. Background technique [0002] Plasma processing equipment is processing equipment widely used in the field of semiconductor manufacturing. [0003] Please refer to figure 1 , figure 1 It is a schematic structural diagram of a typical plasma processing device. [0004] The plasma processing apparatus 1 generally includes a housing 11 having a reaction chamber 12 therein. The top and bottom of the reaction chamber 12 are respectively provided with an upper pole plate 13 and a lower pole plate 14 correspondingly; the top of the lower pole plate 14 can support workpieces to be processed. The above-mentioned workpieces shall include wafers and glass substrates, as well as other workpieces having the same processing principles as the two. The meaning of the workpiece described below is ...

Claims

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Application Information

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IPC IPC(8): G05B23/00G05D7/00H01L21/00
Inventor 南建辉宋巧丽
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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