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Negative type infrared light responsive composition, negative type printing plate and method of use thereof

A composition, infrared light technology, applied in the field of printing plates, to achieve the effects of high print resistance, good lipophilicity and high sensitivity

Active Publication Date: 2012-07-04
LUCKY HUAGUANG GRAPHICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to overcome the shortcomings of the existing boards that the quality of the boards becomes unstable over time, and to provide a high-sensitivity, storage Negative working infrared sensitive composition with good performance, good print resistance and good chemical resistance

Method used

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  • Negative type infrared light responsive composition, negative type printing plate and method of use thereof
  • Negative type infrared light responsive composition, negative type printing plate and method of use thereof
  • Negative type infrared light responsive composition, negative type printing plate and method of use thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] (1) Preparation of infrared light-sensitive composition

[0037] (a) Synthesis of hydrophilic polymer I: Add 500ml of absolute ethanol into a 1L four-necked round bottom flask equipped with a sealed mechanical stirring device, reflux condenser, dropping funnel and nitrogen introduction tube, start stirring, and pass in Dry nitrogen and bubble for 15 minutes. Heat the water bath to 60℃, after the temperature is constant, drop in a solution consisting of 144g acrylic acid (2mol), 142g acrylamide (2mol), 1g benzoyl peroxide and 200ml absolute ethanol from which the polymerization inhibitor has been removed, for 30 minutes Finish dripping. After maintaining the reaction at 60°C for 5 hours, add 1 g of benzoyl peroxide, maintain the temperature, continue the reaction for 10 hours, and then terminate the reaction. The reaction mixture was naturally cooled to room temperature.

[0038] The cooled reaction liquid was dropped into 5 L of acetone with a strong stirring and dispersi...

Embodiment 2

[0059] (1) Preparation of infrared light-sensitive composition

[0060] (a) Synthesis of hydrophilic polymer II: Add 500ml of absolute ethanol into a 1L four-necked round bottom flask equipped with a sealed mechanical stirring device, reflux condenser, dropping funnel and nitrogen introduction tube, start stirring, and pass in Dry nitrogen and bubble for 15 minutes. Heat the water bath to 60℃, after the temperature is constant, drop in a solution consisting of 129g methacrylic acid (1.5mol), 213g acrylamide (3mol), 1g benzoyl peroxide and 300ml absolute ethanol from which the inhibitor has been removed , 30 minutes to finish. After maintaining the reaction at 60°C for 5 hours, add 1 g of benzoyl peroxide, maintain the temperature, continue the reaction for 10 hours, and then terminate the reaction. The reaction mixture was naturally cooled to room temperature.

[0061] The cooled reaction liquid was dropped into 5 L of acetone with a strong stirring and dispersing device to prec...

Embodiment 3

[0082] (1) Preparation of infrared light-sensitive composition

[0083] (a) Synthesis of hydrophilic polymer III: Add 500ml of absolute ethanol into a 1L four-necked round bottom flask equipped with a sealed mechanical stirring device, reflux condenser, dropping funnel and nitrogen introduction tube, start stirring, and pass in Dry nitrogen and bubble for 15 minutes. Heat the water bath to 60°C. After the temperature becomes constant, drop a solution consisting of 172g methyl acrylate (2mol), 213g acrylamide (3mol), 1g benzoyl peroxide and 300ml absolute ethanol from which the polymerization inhibitor has been removed. Finished in 30 minutes. After maintaining the reaction at 60°C for 5 hours, add 1 g of benzoyl peroxide, maintain the temperature, and continue the reaction for 10 hours before stopping the reaction. The reaction mixture was naturally cooled to room temperature.

[0084] The cooled reaction liquid was dropped into 5L of acetone with a strong stirring and dispersin...

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Abstract

The invention discloses a female pattern infrared light sensitizing composition and a printing plate made of the composition and an application method of the printing plate. The composition mainly contains (1) 45-74 parts by weight of hydrophilic polymer, (2) 5-30 parts by weight of epoxy compound, (3) 5-25 parts by weight of infrared absorption agent and (4) 1-12 parts by weight of an acid producing source. The female pattern infrared light sensitizing composition has the advantages of high light sensitivity, good preservation property , good printing resistance and good chemical resistance.The provided photolithography plate has the advantages of high light sensitivity, good mesh point reducibility and good preservation property, and can be directly mounted on a photolithography machine for printing after exposure.

Description

technical field [0001] The invention relates to a photosensitive composition, in particular to a photosensitive composition for making a negative printing plate, and also to a printing plate prepared with the composition and a use method thereof. Background technique [0002] In the traditional offset printing workflow, the plate is generally composed of a hydrophilic plate base and a resin layer coated on it. After exposure and development, a plate that can be printed on the machine is obtained. After exposure, the non-image part can be removed through a proper development process to expose the hydrophilic plate base. If the exposed part is removed by the development process and the unexposed part remains to form an image, it is called a positive working plate; conversely, if the exposed part remains to form an image and the unexposed part is removed, it is called a negative working plate material. The developer used in the development process is mainly composed of an aq...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B41C1/055B41M5/36
CPCB41C1/1008B41C2210/04B41C2210/08
Inventor 江磊赵伟建宋小伟田东东
Owner LUCKY HUAGUANG GRAPHICS