Alumina coating correlation technique with alpha type crystal structure

A crystal structure, alumina technology, applied in the plating, coating, metal material coating process of superimposed layers, etc., can solve problems such as peeling, cracked film, composition limitation, etc.
CN101445928AInactive Publication Date: 2009-06-03KOBE STEEL LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
KOBE STEEL LTD
Publication Date
2009-06-03
Estimated Expiration
Not applicable · inactive patent

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Abstract

A process for producing an alumina coating composed mainly of alpha-type crystal structure especially excelling in heat resistance, comprising (1) providing a laminate coating including a hard coating composed of a metal component containing Al and Ti as unavoidable elements and a compound of B, C, N, O, etc., oxidizing the hard coating to thereby form an oxide-containing layer, and forming an alumina coating composed mainly of alpha -type crystal structure on the oxide-containing layer. Alternatively, the process comprises (2) forming a hard coating composed of a metal whose standard free energy for oxide formation is greater than that of aluminum and a compound of B, C, N, O, etc., oxidizing the surface of the hard coating to thereby form an oxide-containing layer, and forming an alumina coating while being accompanied by reduction of the oxide at the surface of the oxide-containing layer.
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Description

[0001] This application is PCT application number PCT / JP2003 / 010114 (the application number of which entered the national stage is 03818927.5), the application date is August 8, 2003, and the invention name is "α-type crystal structure as the main body of the aluminum oxide film manufacturing method , Al2O3 film with α-type crystal structure as the main body, laminated film containing the film, component coated with the film or laminated film, its manufacturing method, and physical vapor deposition device” is a divisional application of the invention patent application. technical field

[0002] The present invention relates to a method for producing an alumina film mainly composed of an α-type crystal structure, an alumina film mainly composed of an α-type crystal structure, a laminated film containing an alumina film, and a member coated with an alumina film or a laminated film It also relates to a physical vapor deposition device used in the above manufacturing.

[0003] Spe...

Claims

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