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Alumina coating correlation technique with alpha type crystal structure

A crystal structure, alumina technology, applied in the plating, coating, metal material coating process of superimposed layers, etc., can solve problems such as peeling, cracked film, composition limitation, etc.

Inactive Publication Date: 2009-06-03
KOBE STEEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0029] Regarding the formation of the aluminum oxide film, there are the following problems in the various technologies proposed before: that is, in the above-mentioned Japanese Patent Publication No. 2002-543993 (claims, etc.) and Japanese Patent Publication No. 2002-543997 (claims, etc.) , the formed alumina film is alumina with a γ-type crystal structure (γ-alumina), and this γ-alumina is in a metastable crystalline state among aluminas that exist in various crystalline states. Therefore, the film is exposed to high temperature environments. In the medium, it tends to change into a basically stable α-type crystal structure of alumina (α-alumina). With the phase change, cracks or peeling of the coating may occur.
However, the composition of the binder phase in the cBN sintered body with the film formed by this technique is limited
In addition, in this technology, the CVD method is used as the method for forming the α-alumina film. In this method, a high-temperature atmosphere with a substrate temperature exceeding 1000°C is formed when the film is formed. At this high temperature, the cBN sintered body of the substrate is overheated. , thus potentially transforming into the hBN phase, resulting in an undesirable state of

Method used

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  • Alumina coating correlation technique with alpha type crystal structure
  • Alumina coating correlation technique with alpha type crystal structure
  • Alumina coating correlation technique with alpha type crystal structure

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Embodiment approach 1

[0136] The inventors of the present invention studied a method of forming alumina mainly having an α-type crystal structure in a temperature range of about 800° C. or lower in which properties such as a hard coating and a substrate can be maintained under the above-mentioned conditions. It turns out that the following approach can be taken:

[0137] 1. As the first method, after forming a hard coating composed of Al as an essential metal component and a compound of B, C, N, O, etc., the surface of the hard coating is oxidized, and after forming an oxide-containing layer After the treatment, the method of forming a film of aluminum oxide; or 2. As a second means, using a hard oxide compound composed of a metal whose standard free energy of oxide generation is greater than aluminum and a compound such as B, C, N, O, etc. After the hard coating is formed, the surface of the hard coating is oxidized to form an oxide-containing layer, followed by reduction of the oxide on the surfa...

Embodiment 1

[0420] First, an embodiment of the above-mentioned first means (the first ① and ② method) will be described. A substrate made of cemented carbide with a size of 12.7mm×12.7mm×5mm is mirror-polished (Ra=about 0.02μm), ultrasonically cleaned and dried in an alkaline tank and a pure water tank, and then used for plating of a laminated coating cover.

[0421] In this embodiment, the formation of the hard film, the oxidation treatment of the hard film and the formation of the α-type main alumina film are all in the Figure 4 It carried out in the vacuum film-forming apparatus shown (Kobe Steel Co., Ltd. AIP-S40 composite machine).

[0422] The hard coating on the substrate is formed in Figure 4 In the device 1 shown, the evaporation source 7 for AIP is used for AIP method (arc ion plating method) to form a TiAlN hard coating with a film thickness of 2 to 3 μm and an atomic ratio of Ti and Al (Ti:Al) of 0.55:0.45. A coating or a TiAlCrN hard coating having an atomic ratio of Ti, A...

Embodiment 2

[0438] Next, an embodiment of the above-mentioned second means (first mode ③) will be described.

[0439] A substrate made of cemented carbide with a size of 12.7mm×12.7mm×5mm is mirror-polished (Ra=about 0.02μm), ultrasonically cleaned and dried in an alkaline tank and a pure water tank, and then used for plating of a laminated coating cover.

[0440] Similar to the above-mentioned embodiment 1, in this embodiment, the formation of the hard film, the oxidation treatment of the hard film and the formation of the α-type main alumina film are all in the above-mentioned Figure 4 It carried out in the vacuum film-forming apparatus shown (Kobe Steel Co., Ltd. AIP-S40 composite machine).

[0441] The formation of a hard film on the substrate, in Figure 4 In the shown apparatus 1, a TiN film or a TiCN film with a film thickness of 2 to 3 μm is formed on a substrate by the AIP method (arc ion plating method) using the evaporation source 7 for AIP. In addition, as a reference exampl...

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Abstract

A process for producing an alumina coating composed mainly of alpha-type crystal structure especially excelling in heat resistance, comprising (1) providing a laminate coating including a hard coating composed of a metal component containing Al and Ti as unavoidable elements and a compound of B, C, N, O, etc., oxidizing the hard coating to thereby form an oxide-containing layer, and forming an alumina coating composed mainly of alpha -type crystal structure on the oxide-containing layer. Alternatively, the process comprises (2) forming a hard coating composed of a metal whose standard free energy for oxide formation is greater than that of aluminum and a compound of B, C, N, O, etc., oxidizing the surface of the hard coating to thereby form an oxide-containing layer, and forming an alumina coating while being accompanied by reduction of the oxide at the surface of the oxide-containing layer.

Description

[0001] This application is PCT application number PCT / JP2003 / 010114 (the application number of which entered the national stage is 03818927.5), the application date is August 8, 2003, and the invention name is "α-type crystal structure as the main body of the aluminum oxide film manufacturing method , Al2O3 film with α-type crystal structure as the main body, laminated film containing the film, component coated with the film or laminated film, its manufacturing method, and physical vapor deposition device” is a divisional application of the invention patent application. technical field [0002] The present invention relates to a method for producing an alumina film mainly composed of an α-type crystal structure, an alumina film mainly composed of an α-type crystal structure, a laminated film containing an alumina film, and a member coated with an alumina film or a laminated film It also relates to a physical vapor deposition device used in the above manufacturing. [0003] Spe...

Claims

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Application Information

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IPC IPC(8): C23C28/00C23C8/02C23C8/10C23C30/00
Inventor 小原利光碇贺充玉垣浩
Owner KOBE STEEL LTD
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