Scanning exposure system and method of photo-etching machine

Abstract

The invention provides a scanning exposure system of photoetching machine, comprising a light source and a cylinder lens, a zoom lens set, an optical uniform device, a coupling light set, a mask plate, an objective lens and a workpiece platform which are arranged in order along the light path formed by the light source emergent light beam, a light beam rotating lens set is arranged between the zoom lens set and the optical uniform device and composed of a plurality of sets of optical elements. When scanning exposure, firstly the light beam rotating lens set is transferred into the light path after scanning and exposing the exposure field zone, then the exposure field zone is scanned and exposed again, the rotating lens set is shifted away after completing the scanning exposure, so that the dose homogeneity of exposure field Y direction is improved, and the dose homogeneity of X direction is also improved, thereby improving the system performance of the exposure dose and increasing thehomogeneity of the photoetching line width.

Description

technical field

[0001] The invention relates to a semiconductor device and a method thereof, in particular to a scanning exposure system of a photolithography machine and a scanning exposure method thereof. Background technique

[0002] The core of modern microelectronics technology is integrated circuit production, and the development of integrated circuit production must be supported by semiconductor equipment. In the current integrated circuit production equipment, lithography equipment occupies the most core position. After the lithography technology has gone through several major technical development stages of contact type, proximity type, projection type, scanning type and stepping type, it transitions to stepping and scanning type.

[0003] The three core indicators of lithography machines are line width uniformity, overlay accuracy and productivity. Line width uniformity is an important core index of a lithography machine, and the performance of the dose system and...

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