4 results about "Dose uniformity" patented technology

Methods and systems for radiation treatment planning use objective function formulations to evaluate a proposed (candidate) radiation treatment plan, to determine whether or not clinical goals that are specified for treatment of a patient are satisfied by the plan. Dose distributions for a region of a target volume are generated. A value of an objective function formulation is determined. The value of the objective function formulation is a function of difference between a value that is based on a dose distribution and a value for a range that is associated with the treatment field corresponding to the dose distribution. In this manner, the uniformity of doses of individual treatment fields can be controlled. The value of the objective function formulation can be used in a process for optimizing dose distributions in the radiation treatment plan.

The invention discloses an immersed plasma energy and dose testing device, and relates to the field of semiconductor plasma injection process, in the device, a grid group and a first collector are sequentially arranged in an energy collection device at intervals, the grid group comprises N grids, and a voltage supply module provides corresponding target bias voltage for the grid group; forming a grading energy screening electric field; the first collector collects the screened plasma and converts and outputs a first electric signal; a second collector in the dose collection device collects the total number of plasmas in the device and outputs a second electric signal; and the conversion module gates one path of electric signal at any moment and converts and outputs a target voltage signal to the control module so as to determine the energy distribution and dose distribution of the plasma. According to the scheme, energy testing and dosage testing can be carried out at the same time, it is guaranteed that the ion energy distribution condition and the dosage uniformity condition are accurately monitored in the one-time plasma injection process, and wafer modification errors are reduced.

This invention proposes a method for optimizing the dose uniformity of laser interference lithography stitching based on Gaussian beam fitting, belonging to the field of ultra-precision micro / nano manufacturing technology. Addressing the stitching unevenness problem caused by beam distortion and finite boundary effects in large-area stepping interference lithography, this invention acquires actual interference light field images and performs global two-dimensional Gaussian fitting to accurately extract spot feature parameters. Based on this, a dose accumulation model under finite dot matrix scanning is constructed, and the optimal two-dimensional step displacement that can compensate for local interference troughs and macroscopic attenuation envelope is calculated through optimization. Simultaneously, an exposure dose constraint mechanism is introduced to limit the cumulative total light intensity within the development threshold range to prevent photoresist overexposure degradation caused by high overlap. Finally, the optimal parameters are output and used to control the positioning stage for precise exposure. This invention effectively overcomes the obvious gaps and energy distortion caused by traditional fixed-spacing stitching, achieving high-quality, seamless stitching manufacturing of large-area holographic gratings.

The application discloses an X-ray blood irradiation device calibration device and a calibration method. The calibration device comprises a detector, a detector host and a blood equivalent phantom. According to the target irradiation container, the blood equivalent phantom is selected and placed, the detector is connected with the blood equivalent phantom, the detector is moved to a reference point, the absorbed dose value of the reference point is read to calculate the indication error, the absorbed dose value of each measurement point is read to calculate the absorbed dose uniformity of the target irradiation container, and the reference points of each irradiation container are taken as measurement points, the values read by the detector are used to calculate the consistency of the absorbed dose values among the irradiation containers. The scheme realizes the measurement of dynamic blood irradiation dose, solves the problem that the existing X-ray blood irradiation device cannot accurately measure the irradiation dose and the irradiation dose uniformity, realizes the transmission of data without punching in the measurement chamber, the measurement result can be reproduced, and is more suitable for repeated measurement.