Heavy diffusion and light diffusion technology for manufacturing selective emitter solar battery

A solar cell and manufacturing process technology, applied in the field of heavy diffusion and light diffusion technology, can solve problems such as reducing contact resistance

Active Publication Date: 2009-07-29
JA SOLAR TECH YANGZHOU +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Just by adjusting the temperature, gas flow and reaction time of the traditional one-step diffusion process, it is impossible to solve the dead layer problem (Dead layer) and reduce the contact resistance at the same time. Therefore, the traditional diffusion process limits the short-circuit current, open-circuit voltage, fill factor and efficiency. improvement

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The heavy diffusion process in the manufacturing process of the selective emitter solar cell provided by the present invention is applied under the electrode grid line and its vicinity, so that these areas form a highly doped deep diffusion area; the light diffusion process is applied to the non-electrode grid line area, so that These regions form lightly doped shallow diffusion regions; both the heavy diffusion process and the light diffusion process include the following steps:

[0027] (1) Loading: Push the quartz boat loaded with silicon wafers into the diffusion furnace tube;

[0028] (2) Temperature stable (Temperature stable): Make the temperature in the diffusion furnace tube completely stable;

[0029] (3) Diffusion / Redistribution (Doping / Driving in): The phosphorus oxychloride is brought into the diffusion furnace tube through a small flow of nitrogen for diffusion;

[0030] (4) Loading: The quartz boat loaded with the diffused silicon wafer is withdrawn from...

Embodiment 2

[0042] The heavy diffusion process in the manufacturing process of the selective emitter solar cell provided by the present invention is applied under the electrode grid line and its vicinity, so that these areas form a highly doped deep diffusion area; the light diffusion process is applied to the non-electrode grid line area, so that These regions form lightly doped shallow diffusion regions; both the heavy diffusion process and the light diffusion process include the following steps:

[0043] (1) Loading: Push the quartz boat loaded with silicon wafers into the diffusion furnace tube;

[0044] (2) Temperature stable (Temperature stable): Make the temperature in the diffusion furnace tube completely stable;

[0045] (3) Diffusion / Redistribution (Doping / Driving in): The phosphorus oxychloride is brought into the diffusion furnace tube through a small flow of nitrogen for diffusion;

[0046] (4) Loading: The quartz boat loaded with the diffused silicon wafer is withdrawn from...

Embodiment 3

[0058] The heavy diffusion process in the manufacturing process of the selective emitter solar cell provided by the present invention is applied under the electrode grid line and its vicinity, so that these areas form a highly doped deep diffusion area; the light diffusion process is applied to the non-electrode grid line area, so that These regions form lightly doped shallow diffusion regions; both the heavy diffusion process and the light diffusion process include the following steps:

[0059] (1) Loading: Push the quartz boat loaded with silicon wafers into the diffusion furnace tube;

[0060] (2) Temperature stable (Temperature stable): Make the temperature in the diffusion furnace tube completely stable;

[0061] (3) Diffusion / Redistribution (Doping / Driving in): The phosphorus oxychloride is brought into the diffusion furnace tube through a small flow of nitrogen for diffusion;

[0062] (4) Loading: The quartz boat loaded with the diffused silicon wafer is withdrawn from...

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Abstract

The invention discloses a heavy diffusion technology and a light diffusion technology in the manufacture process of a selective emitter solar cell. The heavy diffusion technology is applied below and around an electrode grid line, while the light diffusion technology is applied to a non-electrode grid line area. A high doping deep diffusion area is formed below and around the electrode grid line and a low doping shadow diffusion area is formed in the non-electrode grid line area by changing temperature, air flow quantity and technological time of the two diffusion technologies. The technologies solve the problem that the traditional one-step diffusion technology cannot reduce contact resistance on the surface of a silicon slice and a dead layer simultaneously, and have great meaning to the improvement of the overall performance of a crystalline silicon solar cell.

Description

technical field [0001] The invention belongs to the field of solar cell manufacturing, and in particular relates to a heavy diffusion and light diffusion process in the manufacturing process of a selective emitter solar cell. technical background [0002] The traditional screen printing process is widely used in the large-scale production of monocrystalline silicon solar cells. The main production process is to use a conventional high-temperature diffusion process in a tubular diffusion furnace to make the emitter, and then coat the emitter with an anti-reflection film and Print the front metal electrode and the back contact electrode to complete the photoelectric conversion. The high-temperature diffusion process in the traditional screen printing solar cell manufacturing process is one-step diffusion, and the surface sheet resistance of the emitter area is distributed in the range of 40-50Ω / □. This resistance range means that the emitter area has high contact resistance an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 李静周鹏宇
Owner JA SOLAR TECH YANGZHOU
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