Film forming device, film forming system, and film forming method
A film-forming device and film-forming method are applied in lighting devices, ion implantation plating, coating, etc., and can solve the problems of inability to improve productivity, increase in space occupied, and increase in and out processes, so as to prevent contamination, The effect of increasing productivity and avoiding contamination
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[0031] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, as an example of film formation, a manufacturing process of an organic EL element A manufactured by forming an anode layer 1, a light emitting layer 2, and a cathode layer 4 on a glass substrate G will be specifically described as an example. . In addition, in this specification and drawings, the same code|symbol is attached|subjected to the component which has substantially the same functional structure, and repeated description is abbreviate|omitted.
[0032] figure 1 (1)-(7) are explanatory drawings of the manufacturing process of the organic EL element A. like figure 1 As shown in (1), the anode layer 1 is previously formed in a predetermined pattern on the surface of the glass substrate G used in this embodiment. A transparent electrode made of, for example, ITO (Indium Tin Oxide) is used on the anode layer 1 .
[0033] First, if f...
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