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Film forming device, film forming system, and film forming method

A film-forming device and film-forming method are applied in lighting devices, ion implantation plating, coating, etc., and can solve the problems of inability to improve productivity, increase in space occupied, and increase in and out processes, so as to prevent contamination, The effect of increasing productivity and avoiding contamination

Inactive Publication Date: 2009-08-05
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when an independent processing container is provided for each film forming mechanism, the overall size of the film forming system increases and the space occupied increases.
In addition, every time each layer is formed, the substrate must be unloaded from the processing container and then loaded into another container. This increases the number of loading and unloading processes, and therefore cannot improve productivity.

Method used

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  • Film forming device, film forming system, and film forming method
  • Film forming device, film forming system, and film forming method
  • Film forming device, film forming system, and film forming method

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Embodiment Construction

[0031] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, as an example of film formation, a manufacturing process of an organic EL element A manufactured by forming an anode layer 1, a light emitting layer 2, and a cathode layer 4 on a glass substrate G will be specifically described as an example. . In addition, in this specification and drawings, the same code|symbol is attached|subjected to the component which has substantially the same functional structure, and repeated description is abbreviate|omitted.

[0032] figure 1 (1)-(7) are explanatory drawings of the manufacturing process of the organic EL element A. like figure 1 As shown in (1), the anode layer 1 is previously formed in a predetermined pattern on the surface of the glass substrate G used in this embodiment. A transparent electrode made of, for example, ITO (Indium Tin Oxide) is used on the anode layer 1 .

[0033] First, if f...

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Abstract

The invention provides a film forming device, a film forming system and a film forming method. A film forming system in which mutual contamination in each layer formed in a process of producing an organic EL element etc. is avoided, that has a small footprint, and that has high productivity. [MEANS FOR SOLVING PROBLEMS] A film forming device (13) for forming a film on a substrate. The film forming device (13) has, inside a processing container (30), a first film forming mechanism (35) for forming a first layer and a second film forming mechanism (36) for forming a second layer. A gas discharge opening (31) for reducing the pressure in the processing container (30) is provided in the film forming device (13), and the first film forming mechanism (35) is located closer to the gas discharge opening (31) than the second film forming mechanism (36). The first film forming mechanism (35) forms, for example, the first layer on the substrate by vapor deposition, and the second film forming mechanism (36) forms, for example, the second layer on the substrate by spattering.

Description

technical field [0001] The present invention relates to a film forming device and a film forming system for forming a layer of a predetermined material on a substrate, and to a film forming method. Background technique [0002] In recent years, an organic EL device utilizing electroluminescence (EL; electroluminescence) has been disclosed. Organic EL elements have the following advantages: since they do not generate heat substantially, they consume less power than Braun tubes, and because they are self-illuminating, they have an excellent viewing angle compared to liquid crystal displays (LCDs). Organic EL elements I attract attention for future development. [0003] The most basic structure of this organic EL element is a sandwich structure formed by laminating an anode layer, a light emitting layer, and a cathode layer on a glass substrate. A transparent electrode made of ITO (Indium Tin Oxide, Indium Tin Oxide) is used on the anode layer on the glass substrate in order ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/56H01L51/50C23C14/06H05B33/10
CPCH01L51/56C23C14/568H10K71/421H10K71/164H10K71/191H10K71/16H10K50/11H10K50/16H10K50/15H10K71/00
Inventor 松林信次茂山和基户部康弘
Owner TOKYO ELECTRON LTD