Processing method for nano-pole forest

A processing method and nano-column technology, applied in the direction of nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problems that it is difficult to control the high consistency of nanostructures, and the complexity of metal catalysts increases the process, so as to promote research and production development , Improve production efficiency and integration, reduce the effect of industrial production costs

Active Publication Date: 2009-08-19
PEKING UNIV
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Problems solved by technology

However, when using the self-catalytic VLS growth mechanism to prepare nanostructures, the preparation and uniform distribution of m...

Method used

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  • Processing method for nano-pole forest
  • Processing method for nano-pole forest
  • Processing method for nano-pole forest

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Embodiment Construction

[0016] The present invention will be described in detail below in conjunction with the accompanying drawings and examples.

[0017] The invention utilizes the special physical and chemical properties of the oxygen plasma dry degumming process and the anisotropic dry etching technology in the traditional microelectronics process, and proposes a "bottom-up" and "top-down" nano Column Forest Parallel Processing Method.

[0018] Nano column forest parallel processing method of the present invention, its principle is:

[0019] Such as figure 1 As shown, the photoresist 2 is spin-coated on the surface of the substrate 1, and then the photoresist is exposed by conventional optical lithography equipment, and the photoresist 2 is developed using a corresponding developer to remove the excess photoresist 2, On the substrate 1, only the pattern of the photoresist 2 at the position of the predesigned nano-pillar forest is left, that is, the shape corresponding to the nano-pillar forest....

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Abstract

The invention relates to a method for processing a nano column forest, which comprises the following steps: 1) preparing and cleaning a selected substrate; 2) spirally coating photoresist on the surface of the substrate, performing pre-baking, exposure and development on the photoresist in turn, and finally forming a photoresist graph; 3) performing oxygen plasma dry etching on the photoresist graph, and forming a layer of graphic nano punctiform structure on the substrate; 4) using the nano punctiform structure as a mask to perform anisotropic etching on the substrate, and forming an initial nano column; 5) forming a deposit film on the surface of the initial nano column; 6) forming a side wall on the circumference of the initial nano column through an anisotropic etching film; 7) taking the initial nano column which coats the side wall as the mask to perform the anisotropic etching on the substrate, and forming a nano column; and 8) removing side wall residue on the surface of the nano column, and obtaining a graphic nano column forest structure. The graphic nano column forest manufactured by the method can be widely applied to novel energy resource devices, biomedicine detectors, micro-fluidic devices, electronic devices and nano stamping.

Description

technical field [0001] The invention relates to the field of nano material processing, in particular to a processing method of nano column forest. Background technique [0002] Nanopillar forests refer to large-area nanoscale columnar structures with large densities on the surface of materials. Nanopillar forests have broad and important application prospects in new energy devices, biomedical detection devices, microfluidic devices, electronic devices, and nanoimprinting. For example, the nanopillar forest can be used as a catalytic structure in liquid micro-fuel cells, as a carrier structure of biomolecules in biomedical detection devices, can be used to form regions with different hydrophilic and hydrophobic properties, and can be used as an electron emission tip in field emission. The device can also be used as a mold for nano-imprinting to realize batch transfer of nano-patterns. Therefore, how to process and manufacture nanopillar forests is gradually becoming an impo...

Claims

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Application Information

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IPC IPC(8): B82B3/00
Inventor 毛海央吴文刚吴迪郝一龙王阳元
Owner PEKING UNIV
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