Immersion self-adaptation rotary sealing device for photo-etching machine

Abstract

The invention discloses an immersion self-adaptation rotary sealing device for photo-etching machine, which is arranged between a projection lens group and a substrate and comprises an inner chamber, a rotary member, a rotary excitation structure and a permanent magnet plate. A plurality of groups of spiral air inlet slots arranged on the rotary member, the outside air is sucked from the air inlet slots by the rotary motion of the rotary member, a cylindrical air curtain is formed at the boundary of flow field to prevent the liquid from leaking outsides. The rotary air curtain is benefical to rapidly guide the redundant liquid at the backward contact angle to the forward contact position under the high-speed movement of the substrate, the relatively steady boundary flow field is obtained by the compensation. When the liquid enters into the air inlet slots because of the big pulling of the substrate, the inward backflow impact for the boundary flow field is formed by liquid in the air inlet slots under the movement of the rotary member, thus counteracting the outward leaking power of liquid, and the counteracting power increases with the increase of the outward impact force of liquid.

Description

technical field [0001] The invention relates to a liquid supply and recovery sealing device in an immersion lithography (Immersion Lithography) system, in particular to an immersion self-adaptive rotary sealing device for a lithography machine. Background technique [0002] Modern lithography equipment is based on optical lithography, which uses an optical system to accurately project and expose the pattern on the mask onto a substrate (such as a silicon wafer) coated with photoresist. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a substrate covered with photosensitive photoresist. [0003] The immersion lithography system fills the gap between the projection lens and the substrate with a certain liquid, and increases the numerical aperture (NA) of the projection lens by increasing the refractive index of the medium in the gap, thereby improving the resolution and focus of the lithography. deep. ...

AI Technical Summary

Problems solved by technology

The larger the advancing contact angle, the easier it is for the outside gas to be entrained into the flow field to form bubbles, thereby affecting the uniformity of the flow field and the exposure imaging quality; the smaller the receding contact angle, the easier it is for the boundary liquid to be pulled to the periphery of the flow field, resulting in Liquid leaks, and thus forms a series of defects (such as: water marks)

The disadvantages of using pressure-equalizing gas seals are mainly reflected in: a smaller air seal pressure will make it easier to leak at the forward contact angle, and a larger air seal pressure will increase the entrainment of liquid bubbles at the receding contact angle Possibility; the possibility of defects is increased due to the inability to adjust the air seal pressure at different positions in real time

[0007] (2) The high-speed pulling of the substrate forces the liquid at the advancing contact angle to move into the inner flow field, resulting in insufficient liquid supply and entrainment of air bubbles; while the liquid at the receding contact angle impacts the seal under the pulling of the substrate, aggravating possibility of leakage

During the high-speed movement of the substrate, once the external air or sealing liquid is involved or dissolved or diffused into the filling liquid, it will have a negative impact on the exposure quality

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