Master synthesis and contraposition process
A master and process technology, applied in the field of master synthesis and alignment technology, can solve the problem of high cost of photopainting master, achieve the effect of easy implementation, avoid high cost, and reduce manufacturing cost
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Embodiment 1
[0027] A master-plate synthesis alignment process, comprising the following steps:
[0028] (1) Synthesize the large-aperture master of the required graphics:
[0029] (1) Utilize the large-aperture original master to copy a plurality of first film plates, and the graphics formed on the copied first film plates are the same as those on the large-aperture original master; the copying conditions are: use the exposure machine to vacuumize Under the conditions of system vacuum pumping, semi-vacuum pumping 20S, and full vacuum pumping 50S, the large-aperture original master plate is used as a mask and the film is tightly combined for exposure. The exposed luminous flux is 65lm; 25°C developer solution to develop the exposed film, so that the pattern formed on the film is the same as that on the original large-aperture master; then use a 38°C fixer to form a black and white stable pattern on the film; and then After fixing, the film is washed with water, the developer and fixer on ...
Embodiment 2
[0041] A master-plate synthesis alignment process, comprising the following steps:
[0042] (1) Synthesize the large-aperture master of the required graphics:
[0043] (1) Use the large-aperture original master to copy multiple first film plates; the copying conditions are: use the vacuum pumping system of the exposure machine to pump air, semi-vacuum pumping for 30S, and full-vacuum pumping for 75S under the condition of large-aperture The original master plate is exposed by the close combination of the mask and the film, and the exposure luminous flux is 90lm; then use a developing machine, using a developer with a working temperature of 36°C, to develop the exposed film, so that the film is formed on the film. The same graphics as the master; then use a fixer solution at 36°C to form a black and white stable graphic on the film; then wash the fixed film with water to remove the developer and fixer solution on it, and then heat it under the condition of 43°C Drying for 40S;...
Embodiment 3
[0055] A master-plate synthesis alignment process, comprising the following steps:
[0056] (1) Synthesize the large-aperture master of the required graphics:
[0057] (1) Use the large-aperture original master to copy multiple first film plates; the copying conditions are: use the vacuum pumping system of the exposure machine to vacuum, semi-vacuum pumping for 50S, and full vacuum pumping for 100S under the condition of large-aperture The original master plate is exposed by the close combination of the mask and the film, and the exposure luminous flux is 120lm; then use a developing machine, using a developer with a working temperature of 38°C, to develop the exposed film, so that the film is formed on the film. The same pattern as the master; then use a fixer at 25°C to form a black and white stable pattern on the film; then wash the fixed film with water to remove the developer and fixer on it, and then place it under the condition of 37°C Drying for 35S; the first film pl...
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