Silicon-based photoelectric detector for photoelectric monolithic integration and preparation method thereof
A photodetector and monolithic integration technology, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve problems such as low frequency response, poor short-wave response, and incomplete compatibility between preparation technology and standard technology, and achieve good results. Isolation effect, compatibility of preparation process, and the effect of overcoming poor short-wave response
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[0054] The following embodiments will further illustrate the present invention in conjunction with the accompanying drawings.
[0055] figure 1 and figure 2 The manufacturing process flow of the silicon-based photodetector under the BCD standard process shown is as follows: first, BN is photolithographically etched on a P-type silicon substrate 1 with a resistivity of 15-25Ωcm. + The buried layer region, and the implantation dose is about 1×10 by ion implantation process 15 Antimony forms BN + Buried layer 2. The implantation dose by ion implantation process is about 4×10 12 The boron forms BP + Buried layer 3. in BN + Buried layer 2 and BP + An N-EPI epitaxial layer 4 is grown on the buried layer 3 . The resistivity of the N-EPI epitaxial layer 4 is 3.5 Ωcm, and the thickness is 4.5 μm. The N well region is photolithographically etched on the epitaxial layer 4, and the implantation dose is about 6.5×10 by ion implantation process. 12 Phosphorus is used to realize...
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