Unlock instant, AI-driven research and patent intelligence for your innovation.

Novel diketopyrrolopyrrole polymers

A polymer, alkyl technology, applied in diketopyrrolopyrrole dyes, photovoltaic power generation, electrical components and other directions, can solve the problem of not giving DPP-polymer teaching, etc., to achieve excellent solubility, low on-state voltage, excellent The effect of film-forming properties

Active Publication Date: 2014-07-02
CLAP有限公司
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] Furthermore, no teaching is given how to select other DPP-polymers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel diketopyrrolopyrrole polymers
  • Novel diketopyrrolopyrrole polymers
  • Novel diketopyrrolopyrrole polymers

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0322]

[0323] 0.010 g (0.04 mmol) of palladium(II) acetate and 0.067 g (0.22 mmol) of tris(o-tolyl)phosphine in 10 ml of N-methyl-2-pyrrolidone (NMP) were added to 0.143 g (1.10 mmol) 1,4-divinylbenzene and 0.520g (1.10mmol) 1,4-dioxo-2,5-di-n-hexyl-3,6-bis(bromophenyl)pyrrolo[3,4- c] Pyrrole (prepared according to the method described in EP-A-1087005, EP-A-1087006, or EP-A-133156) was neutralized and stirred at room temperature for 30 minutes. After addition of 0.4 ml (2.89 mmol) triethylamine the reaction mixture was heated at 100°C for 24 hours. The suspension was slurried in 100 ml methanol. The precipitate was filtered off and washed with methanol (3 x 100ml). Low molecular weight impurities can be isolated from the crude polymer by Skoslet extraction in methanol.

[0324] Yield: 0.439g

[0325] Mw: 41000

[0326] in CHCl 3 UV / Vis-absorption in: 499nm

[0327] in CHCl 3 Fluorescence in: 565nm

Embodiment 2

[0329]

[0330] 0.024 g (0.11 mmol) of palladium(II) acetate and 0.165 g (0.54 mmol) of tris(o-tolyl)phosphine in 20 ml of dimethylformamide (DMF) were added under nitrogen atmosphere to 0.353 g (2.71 mmol) of 1 , 4-divinylbenzene and 1.666g (2.71mmol) 1,4-dioxo-2,5-di-n-hexyl-3,6-bis(bromophenyl)pyrrolo[3,4-c]pyrrole Neutralize and stir at room temperature for 30 minutes. After addition of 0.9 ml (6.78 mmol) triethylamine the reaction mixture was heated at 100° C. for 42 hours. After removing 10 ml of DMF in vacuo, the formed polymer was precipitated by adding 200 ml of methanol. The precipitate was dissolved in 110 ml of chloroform and added dropwise to 800 ml of methanol. The precipitated polymer was filtered off and dried under high vacuum.

[0331] Yield: 1.322g

[0332] Mw: 31000

[0333] in CHCl 3 UV / Vis-absorption in: 529nm

[0334] in CHCl 3 Fluorescence in: 579nm

Embodiment 3

[0336]

[0337] 0.230g (0.37mmol) 1,4-dioxo-2,5-di-n-hexyl-3,6-bis(bromophenyl)pyrrolo[3,4-c]pyrrole, 0.003g(0.02mmol) A solution of palladium(II) acetate, 0.1 ml (0.93 mmol) triethylamine and 0.023 g (0.08 mmol) tris(o-tolyl)phosphine in 15 ml NMP was added over 90 minutes under nitrogen atmosphere and under vigorous stirring in 5 ml In 0.487 g (3.74 mmol) 1,4-divinylbenzene in NMP. Then, the reaction mixture was stirred at room temperature for 14 hours and at 80° C. for 6 hours. 100 ml of methanol was added to the resulting mixture. The precipitate formed (product b) was filtered off and washed with 150 ml of methanol. The low molecular weight product a precipitated in the methanol wash solution after 24 hours.

[0338] Yield: 0.075g (product a); Mw: 860

[0339] 0.076g (product b); Mw: 1300

[0340] in CHCl 3 UV / Vis absorption in: 510nm (product a)

[0341] 515nm (product b)

[0342] in CHCl 3 Fluorescence in: 569nm (product a)

[0...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
molecular weightaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention relates to polymers comprising a repeating unit of the formula (I) their use in electronic devices. The polymers according to the invention have excellent solubility in organic solvents and excellent film-forming properties. In addition, high charge carrier mobilities and high temperature stability of the emission color are observed, if the polymers according to the invention are used in polymer light emitting diodes (PLEDs).

Description

[0001] This application is a divisional application of the Chinese patent application with the application number 200480031709.2, the application date was October 18, 2004, and the invention title is "novel diketopyrrolopyrrole polymer". technical field [0002] The present invention relates to polymers comprising repeat units of general formula (I) and their use in electronic devices. The polymers according to the invention have excellent solubility in organic solvents and excellent film-forming properties. Furthermore, if the polymers according to the invention are used in polymer light emitting diodes (PLEDs), high charge carrier mobility and high temperature stability of the emission color can be observed. Background technique [0003] M. Smet et al. describe in Tetrahedron Lett. 42 (2001) 6527-6530, using brominated 1,4-dioxo-3,6-diphenylpyrrolo[3,4-c]pyrrole ( DPP) derivatives and 1,4-dibromo-2,5-di-n-hexylbenzene as monomers, rod-like diketopyrrolopyrrole oligomers w...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08G61/12C08G73/06C09K11/06H05B33/14H01L51/00H01L51/50H01L51/54C08G61/00C08G73/00C09K11/00H05B33/00H10K99/00
CPCC08G61/125C08G61/123H01L51/0035C09K2211/1029H01L51/0036C08G73/0694C09B57/004C08G73/0611C09K11/06C08G61/124H05B33/14C08G61/126C08G73/0688C09B69/109Y02E10/549H10K85/111H10K85/113C08G61/12C08G73/00H10K10/00
Inventor I·黑姆B·蒂克R·伦茨B·施密德哈尔特A·R·拉宾德拉纳特M·迪格利
Owner CLAP有限公司