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Method and system for preparing anhydrous hydrogen chloride gas

A hydrogen chloride gas and hydrogen chloride technology, applied in the direction of chlorine/hydrogen chloride, etc., can solve the problems of expensive equipment, low dehydration depth, serious problems, etc., and achieve the effect of low system equipment cost, easy operation, and deep dehydration depth

Active Publication Date: 2010-07-14
北京华宇同方化工科技开发有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, corrosion-resistant materials must be used, such as Hass alloy, and the equipment is expensive and has no use value
Concentrated sulfuric acid method, that is, using concentrated sulfuric acid to absorb water in hydrogen chloride, due to the influence of balance, the dehydration depth is not deep, and the water content in hydrogen chloride is 100×10 -6 Above, and the evaporation concentration of dilute sulfuric acid is troublesome, and the corrosion of the whole device is quite serious

Method used

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  • Method and system for preparing anhydrous hydrogen chloride gas
  • Method and system for preparing anhydrous hydrogen chloride gas
  • Method and system for preparing anhydrous hydrogen chloride gas

Examples

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Embodiment 1

[0017] Flow Description:

[0018] The raw material gas ① enters from the upper part of the distillation column (C-101), flows upward, exchanges heat and mass with the condensate flowing downward from the top condenser (E-101) in the tower, and passes through the top condenser (E-101) After cooling and condensing, it is released from the top, and the product gas ③ discharged from the top is heated by the product heater (E-102) to form the final product gas ④; while the downward flowing liquid in the tower is discharged through the tower kettle to form a by-product ②.

[0019] The top condenser (E-101) pipes the hydrogen chloride gas, and the cooling medium outside the pipe. The cooling medium can be dichloroethane, which is cooled by the refrigerator (Z-101) and transported by the pump (P-101). The heat exchange medium used by the product heater (E-102) is ethylene glycol ⑤, and the cold ethylene glycol ⑥ is heated by hot water through the plate heat exchanger (E-103).

[00...

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Abstract

The invention discloses a method and a system for preparing an anhydrous hydrogen chloride gas. The method of the invention comprises that: a hydrous hydrogen chloride gas enters a dehydrating tower (C-101) from the bottom of the dehydrating tower (C-101) to flow upward; a cold hydrogen chloride liquid enters the dehydrating tower (C-101) from the top of the dehydrating tower (C-101) to flow downward and carries out heat and mass exchange with the hydrous hydrogen chloride gas flowing upward in the dehydrating tower (C-101), wherein the cold hydrogen chloride liquid flowing downward makes the temperature of the hydrous hydrogen chloride gas flowing upward reduced to below the dew point of the hydrogen chloride gas the liquid water content of which is 10*10-6 under the system pressure in the dehydrating tower (C-101); and then collecting the hydrogen chloride gas discharged from the tower top of the dehydrating tower (C-101) to obtain the anhydrous hydrogen chloride gas. The method of the invention does not introduce extra impurities, has deep dehydrating depth, saves materials, and has low cost and simple and convenient operation.

Description

technical field [0001] The invention relates to a method and system for preparing anhydrous hydrogen chloride gas, in particular to a method for preparing anhydrous hydrogen chloride gas with a water content of 10×10 -6 The following methods and systems for anhydrous hydrogen chloride gas. Background technique [0002] Due to the rapid rise of solar energy technology, a large amount of polysilicon is required, and high-quality trichlorosilane is required for the manufacture of polysilicon, and the quality of hydrogen chloride used in the manufacture of trichlorosilane has an important impact on the output and quality of trichlorosilane. Among the various impurities of hydrogen chloride gas, the impact of water impurities is the most serious and the most difficult to remove. If the water in hydrogen chloride can be removed to 10×10 -6 Below, hydrogen chloride gas is no longer corrosive. In this way, the anhydrous hydrogen chloride can be processed according to the actual ne...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/01
Inventor 张吉瑞
Owner 北京华宇同方化工科技开发有限公司
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