Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

300mm vertical oxidation furnace quartz boat rotary device

A technology of rotating device and oxidation furnace, which is applied to vertical furnaces, furnaces, furnace types, etc., can solve the problems of silicon wafer surface temperature, uneven gas concentration, and affect product quality, achieve uniform temperature and air flow, and improve processing quality , position control precise effect

Active Publication Date: 2010-08-25
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF0 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the quartz boat lifting mechanism of the previous vertical oxidation furnace, the quartz boat does not rotate during the process, and the quartz boat only moves up and down on the lifting mechanism, resulting in insufficient temperature and gas concentration on the surface of the silicon wafer. Uniformity, affecting product quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • 300mm vertical oxidation furnace quartz boat rotary device
  • 300mm vertical oxidation furnace quartz boat rotary device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0007] Below in conjunction with accompanying drawing and embodiment the present invention is further described: embodiment: referring to accompanying drawing, 300mm vertical oxidation furnace quartz boat rotating device is characterized in that: stepping motor 2 is provided, and the bottom of quartz boat is provided with SiC material The finished turntable 1 is provided with a fixed shaft 1.1 at the center of the bottom of the SiC turntable, and a pulley 1.2 is provided at the lower end of the fixed shaft, and the pulley is connected to the stepping motor through a transmission belt 2.1; There is a boat rotating positioning device 3, on the upper part of the fixed shaft, there is a sealed cavity 4 wrapped around the fixed shaft, which is made of polytetrafluoroethylene. A furnace door 5 is provided under the SiC turntable, and a water cooling chamber 5.1 is provided in the furnace door, and a shaft cover 5.2 is fixed at the bottom of the furnace door. A sealing ring 5.3 is pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a 300mm vertical oxidation furnace quartz boat rotary device which comprises a stepper motor, wherein an SiC rotary table is arranged below a quartz boat, and a fixed shaft is arranged at the center of the bottom of the SiC rotary table; a belt wheel is arranged at the lower end of the fixed shaft and is connected with the stepper motor through a driving belt in a driving way; a boat rotary positioning device is arranged at the lower part of the fixed shaft; a sealing cavity is arranged at the upper part of the fixed shaft, and an air inlet-outlet pipe is arranged in the sealing cavity; a furnace door with a water-cooled cavity is arranged below the SiC rotary table, and a shaft cover is fixedly arranged at the bottom of the furnace door; a sealing ring is arranged between the bottom end of the shaft cover and the fixed shaft of the SiC rotary table, and a plurality of buffers are arranged below the furnace door; and a sealing baffle is also arranged below the periphery of the furnace door. The 300mm vertical oxidation furnace quartz boat rotary device has perfect structure and flexible control and precise horizontal position and vertical position control, so that silicon wafers are heated evenly, and the silicon wafer film thickness uniformity is improved.

Description

technical field [0001] The invention belongs to an oxidation furnace equipment used for heat treatment of 300mm silicon wafers, in particular to a quartz boat rotating device in a vertical oxidation furnace used for oxidation treatment of 300mm silicon wafers. Background technique [0002] Oxidation furnace is semiconductor equipment for heat treatment processes such as oxidation and annealing of silicon wafers. Most of the existing oxidation furnaces are horizontal structures, and their temperature uniformity and temperature control accuracy are not ideal. The operation and control are not precise and flexible enough, and the degree of automation is low. , Production efficiency and product quality are not high enough to meet the production needs of 300mm silicon wafers. Therefore, it is necessary to propose a vertical oxidation furnace with improved structure. On the quartz boat lifting mechanism of the previous vertical oxidation furnace, the quartz boat does not rotate d...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): F27B1/10
Inventor 钟华赵星梅董金卫王喆赛义德·赛迪
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com