Group III nitride compound semiconductor light emitting element and manufacturing method thereof
A technology of light-emitting elements and nitrides, which is applied to semiconductor devices, electrical components, circuits, etc., and can solve problems such as increased workload and high manufacturing costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0062] In the exemplary embodiment of the present invention, any conventional technique may be used to manufacture the Group III nitride compound semiconductor element.
[0063] By adjusting the thickness of the buffer layer to be, for example, equal to or greater than and equal to or less than The number of crystal defects as facet origins can be controlled.
[0064] For example, in the case where the GaN layer forms facets as the second layer, by adjusting the thickness of the GaN layer to be equal to or greater than 500 nm and equal to or less than 6 μm, the size of each facet can be controlled.
[0065] For a single light emitting layer that emits light, or a well layer of a single quantum well structure or a multiple quantum well structure, it is preferable to set the indium composition to be equal to or greater than 0.05 and equal to or less than 0.5. In particular, it is preferable to set the indium composition to be equal to or greater than 0.3 and equal to or less...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
