Sers-based, single step, real-time detection of protein kinase and/or phosphatase activity
A phosphatase activity, phosphatase technology, applied in the field of kinase and/or phosphatase detection systems
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[0125] Fabrication and use of SERs microarray
[0126] Fabrication of Nanocone SERS Substrates
[0127] Starting from a monocrystalline silicon wafer, a thin 300 nm thick layer of polycrystalline silicon is deposited on the polished top surface of the silicon wafer. Microscale devices can be patterned on the polysilicon surface using photolithography (photolithography). After patterning, the silicon wafer was etched in a plasma assisted reactive ion etcher. The etching methods for preparing nanopyramidal SERS substrates are different from those used in conventional silicon film etching. First, by using SF 6 Plasma etching for 10 seconds strips the native oxide layer on the polysilicon film. Next, make O 2 and HBr gas were flowed in the RF plasma etch chamber for 7 seconds to define nanoscale oxide islands on top of the polysilicon film. These nanoscale oxide islands are created by simultaneous etching and oxidation processes. The average diameter of the oxide islands is...
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