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Attenuation device capable of adjusting light beam energy

A technology of attenuating device and light beam, which is applied in the direction of exposure device, optics and optical components of photoengraving process, can solve the problems of complex process of attenuator, large influence of device parameters and internal environment, easy to be heated by heat, etc. The effect of improving lithography quality and low cost

Inactive Publication Date: 2011-05-18
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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AI Technical Summary

Problems solved by technology

However, the process of this attenuator is complicated, it is easy to be heated up, and it has a great influence on the parameters of the device itself and the internal environment, which leads to some factors that affect the performance of the system, such as the uniformity of the projection beam, etc.

Method used

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  • Attenuation device capable of adjusting light beam energy
  • Attenuation device capable of adjusting light beam energy
  • Attenuation device capable of adjusting light beam energy

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Embodiment Construction

[0016] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0017] Such as figure 1 It shows that the beam energy adjustable attenuation device of the present invention is arranged between the light source in the projection lithography machine and the lighting system of the lithography equipment, and its main function is to adjust the beam energy emitted by the light source and control the beam input into the lighting system of the lithography equipment Energy, so as to achieve the purpose of controlling the exposure dose and ensuring the quality of lithography.

[0018] Such as figure 1 The medium beam energy adjustable attenuation device is composed of a first flat glass 1 , a second flat glass 2 , a first clamping mechanism 3 , a second clamping mechanism 4 , a transmission me...

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Abstract

The invention relates to an attenuation device capable of adjusting light beam energy. The attenuation device is arranged between a light source and a lighting system of a projection mask aligner, and first flat glass and second flat glass are arranged oppositely, so that an incident light beam passes through the first flat glass and the second flat glass to generate an output light beam, with required intensity, to be input into the lighting system. The first flat glass and the second flat glass are rigidly connected together through a clamping mechanism and a transmission mechanism and are driven by a motor to move in a reversal synchronous rotation manner so as to change the incident angle of the light beam on the flat glass, so that the intensity of the output light beam is changed. In the invention, the continuous change of the intensity of the light beam is allowed under the condition of not changing the position of the incident light beam, the uniformity of a projection beam inthe projection mask aligner is improved, the exposure dosage on a substrate is controlled, and the photoetching quality is improved.

Description

technical field [0001] The invention belongs to the technical field of lithography equipment, and relates to an adjustable light beam energy attenuation device, which adjusts the energy of the light beam entering the lighting system of the lithography equipment according to different lithography requirements. Background technique [0002] Photolithography technology is the best and most common processing technology for manufacturing microstructures in modern processing technology, especially the optical projection lithography technology, which is the modern manufacturing of very large scale integrated circuits (IC), micro-electromechanical systems (MEMS) ), flat panel displays (LCD, OLED, etc.) the most important processing means. [0003] The basic principle of projection lithography technology is similar to the principle of camera photography. The light source passes through the lighting system to form a highly uniform lighting field that meets the requirements, and the ma...

Claims

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Application Information

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IPC IPC(8): G03F7/20G02B1/10
Inventor 李艳丽胡松严伟王建邢薇杨勇陈铭勇
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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