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Double-stage exchange system for lithography machine silicon wafer stages

A technology for exchanging systems and wafer stages, applied in propulsion systems, optomechanical equipment, microlithography exposure equipment, etc., can solve the problems of high guide rail docking accuracy, small moment of inertia, and small motor power, and achieve convenient operation and exchange Simple and easy to control, and the effect of simplifying the system structure

Active Publication Date: 2013-01-16
TSINGHUA UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Aiming at the deficiencies and defects of the prior art, the object of the present invention is to provide a dual-stage exchange system for silicon wafer stages of a lithography machine provided with a rotary exchange bridge, so as to overcome the non-centroid drive and structure of the existing dual-stage exchange systems for silicon wafer stages. Complicated, extremely demanding guide rail docking accuracy, large moment of inertia, etc., make it have the advantages of simple structure, high space utilization, low motor power, small moment of inertia, no need for guide rail docking device, etc., thereby improving the exposure efficiency of the lithography machine

Method used

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  • Double-stage exchange system for lithography machine silicon wafer stages
  • Double-stage exchange system for lithography machine silicon wafer stages
  • Double-stage exchange system for lithography machine silicon wafer stages

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Embodiment Construction

[0021] In the following, the device for exchanging silicon wafer stages of a photolithography machine according to the present invention will be specifically described in conjunction with the accompanying drawings.

[0022] figure 2 It is a structural schematic diagram of a silicon wafer support platform, which includes a coarse movement module 18 and a fine movement module 20 . Both the coarse movement module 18 and the fine movement module 20 include a stationary part, a movable part and a driving part. Connected to the base station 30 is the stationary part 8 of the coarse motion module 18 . The movable part of the coarse motion module 18 is movable relative to the stationary part. Connected to the movable part 10 of the coarse motion module 18 is the stationary part 12 of the fine motion module 20 . The movable part 14 of the micro-motion module 20 is movable relative to the stationary part 12 .

[0023] image 3 Shows the schematic diagram of the structure of double...

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Abstract

Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage (16.2) running at an exposure workstation. A rotating motor (41) is mounted under the base stage (30) for rotating the two wafer stages after the wafer stages have completed pre-processing and exposure operations in order to complete position switch of the wafer stages, wherein the base stage (30) is kept stationary during the switch. The present invention avoids rotation of a large inertia base stage and has low requirement for motor power, while eliminating a guide rail docking device and an auxiliary device and greatly simplifying system configuration. The system is easy and convenient to operate and easy to control.

Description

technical field [0001] The invention relates to a photolithographic equipment including two platforms for holding silicon wafers, in particular to a photolithographic equipment provided with a rotary exchange bridge, which belongs to the field of semiconductor equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the silicon wafer ultra-precision motion positioning system (hereinafter referred to as the wafer stage) la...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H02K41/02
CPCG03F7/70733G03F7/70725H02K41/02G03F7/20
Inventor 朱煜陈亚英张鸣徐登峰汪劲松
Owner TSINGHUA UNIV